A method of pattern formation in which a developed resist pattern is microfined without considerably impairing production cost or production efficiency. This method comprises a step in which a resist patter which has been developed is brought into contact with a treating liquid containing a nonionic surfactant, preferably a polyether surfactant, for 60 seconds or longer to thereby shrink the effective size of the resist pattern formed by development. Also provided is a resist pattern microfined by this method.