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发明授权
CN100592210C 微平版印刷投影曝光装置的投影物镜 失效 - 权利终止

微平版印刷投影曝光装置的投影物镜
摘要：
本发明公开了一种微平版印刷投影曝光装置的投影物镜。该微平版印刷投影曝光装置(110)的投影物镜是为其中浸渍液(134)与感光层(126)邻接的浸渍操作而设计的。浸渍液的折射率大于在投影物镜(120；120’；120”)的物体侧与浸渍液相邻的介质(L5；142；L205；LL7；LL8；LL9)的折射率。投影物镜设计成在浸渍操作期间浸渍液(134)朝物面(122)凸出地弯曲。
摘要（英）：

The invention discloses a projection objective of a microlithographic projection exposure apparatus. A projection objective of a microlithographic projection exposure apparatus (110) is designed for immersion operation in which an immersion liquid (134) adjoins a photosensitive layer (126). The refractive index of the immersion liquid is greater than the refractive index of a medium (L5; 142; L205; LL7; LL8; LL9). that adjoins the immersion liquid on the object side of the projection objective (120; 120'; 120''). The projection objective is designed such that the immersion liquid (134) is convexly curved towards the object plane (122) during immersion operation.

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