公开(公告)号：US20150206732A1

公开(公告)日：2015-07-23

申请号：US14600338

申请日：2015-01-20

Applicant: ULVAC-PHI, Inc.

Inventor： Daisuke SAKAI ,  Mauo SOGOU ,  Kenzo HIRAOKA

IPC: H01J49/16 ,  H01J49/06 ,  G01N23/02 ,  H01J49/26

CPC classification number: G01N23/02 ,  G01N23/2258 ,  H01J27/26 ,  H01J37/08 ,  H01J37/252 ,  H01J49/0468 ,  H01J49/165 ,  H01J2237/0812 ,  H01J2237/2527 ,  H01J2237/3174

Abstract: Provided are an ion source, an ion gun, and an analysis instrument, which are capable of performing sputtering without damage to a surface of a sample and improving detection sensitivity in mass spectroscopy. In the ion source, an emission opening to which ionization liquid is supplied is disposed in an electric field formed in vacuum environment by an extracting electrode so that super large droplet cluster ions are generated from the emission opening. When the sample is irradiated with a super large droplet cluster ion beam, the sample surface is subjected to sputtering without damage, so as to remove contamination substances or to expose a new surface of the sample. In mass spectroscopy, detection sensitivity is improved.

Abstract translation: 提供离子源，离子枪和分析仪器，其能够进行溅射而不损害样品的表面并提高质谱中的检测灵敏度。 在离子源中，在真空环境中由提取电极形成的电场中配置有供给电离液体的发射开口，从而从发射开口产生超大的液滴簇离子。 当用超大液滴簇离子束照射样品时，样品表面经受溅射而不损坏，以便去除污染物质或露出样品的新表面。 在质谱中，检测灵敏度得到改善。

公开(公告)号：US20200312604A1

公开(公告)日：2020-10-01

申请号：US16831082

申请日：2020-03-26

Applicant: ULVAC-PHI, INC

Inventor： Mauo SOGOU ,  Hiromichi YAMAZUI ,  Daisuke SAKAI ,  Katsumi WATANABE

IPC: H01J37/08

Abstract: An analyzing apparatus includes a sample chamber, a measurement apparatus, and a gas cluster ion beam apparatus. A cooling body separates an ionization chamber of the gas cluster ion beam apparatus from a nozzle support to prevent heat emitted by an ionization filament from being transmitted to the nozzle support, and a temperature of a source gas emitted from a nozzle is kept at a constant temperature by a gas heating device while a sputtering rate is kept constant. A pressure of the source gas supplied to the nozzle is kept at constant pressure by a pressure controller, and a size of gas cluster ions is kept at a constant value. Because the sputtering rate is a constant value, highly accurate depth surface profiling can be performed.