公开(公告)号：US20240085776A1

公开(公告)日：2024-03-14

申请号：US18263105

申请日：2022-03-31

Applicant: TECHNOLOGIES DIGITHO INC.

Inventor： Richard BEAUDRY

IPC: G03F7/00 ,  G01B9/02001 ,  G03F1/42

CPC classification number: G03F7/70991 ,  G01B9/0201 ,  G03F1/42 ,  G03F7/70291 ,  G01B2290/25

Abstract: A photolithography mask (10) is provided, said photolithography mask (10) including a plate (15) or an empty frame matrix, a surface of the plate (15) or empty frame matrix including an array of micro-pixels (20), wherein each micro-pixel (20) is independently controllable using an on-board micro-controller (25) in such a manner that a pattern can be generated with the array of micro-pixels (20).