公开(公告)号：US20240337706A1

公开(公告)日：2024-10-10

申请号：US18527798

申请日：2023-12-04

Applicant: Samsung Display Co., LTD.

Inventor： Woong-Jae CHANG ,  SORIM PARK ,  Hee Dok CHOI ,  YOUNGMYO HWANG

IPC: G01R31/66 ,  B08B13/00 ,  G01M11/00

CPC classification number: G01R31/66 ,  B08B13/00 ,  G01M11/00

Abstract: A panel inspection apparatus includes an inspection zone including an inlet through which a display panel is input, an outlet through which the display panel is discharged, and an inspection line extending from the inlet to the outlet through which the display panel is moved, a return zone including a return line extending to the inlet of the inspection zone, a panel carrier on which the display panel is seated, moving from the inlet of the inspection zone to the outlet, and returning from the outlet to the inlet through the return line, and a cleaning part located in the return zone and cleaning the panel carrier in the return line.

公开(公告)号：US20160216143A1

公开(公告)日：2016-07-28

申请号：US14754781

申请日：2015-06-30

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hee Dok CHOI

IPC: G01F1/66 ,  H01L21/67 ,  C23C14/54

CPC classification number: G01F1/662 ,  C23C14/546 ,  H01L21/67253

Abstract: A deposition rate measuring apparatus, including a crystal sensor facing a specific deposition source among a plurality of deposition sources in a deposition apparatus; a deposition-preventing bracket in a front portion of the crystal sensor, the deposition-preventing bracket having an opening that assists inflow of a specific deposition material, the deposition-preventing bracket extending from the opening, and the deposition-preventing bracket surrounding the crystal sensor to prevent interference due to at least one deposition material from at least one adjacent deposition source adjacent to the specific deposition source; and one or more cover portions spaced apart from the opening inward of the deposition-preventing bracket by a predetermined length.

Abstract translation: 一种沉积速率测量装置，包括在沉积装置中的多个沉积源中面向特定沉积源的晶体传感器; 沉积防止支架在晶体传感器的前部，防沉积支架具有帮助特定沉积材料流入的开口，从开口延伸的防沉积支架和围绕晶体的防沉积支架 传感器，以防止来自与特定沉积源相邻的至少一个相邻沉积源的至少一种沉积材料的干扰; 以及一个或多个覆盖部分，其与防沉积托架内部的开口间隔开预定长度。