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公开(公告)号：US11487203B2
公开(公告)日：2022-11-01
申请号：US15858129
申请日：2017-12-29
Inventor： Eui Hyun Ryu , Myung-Yeol Kim , Woo-Hyung Lee , Haemi Jeong , Kwang-Hwyi Im
IPC: G03F7/039 , G03F7/38 , C08F220/28 , C08F220/38 , C08F220/68 , G03F7/038 , C07C323/13 , C07C69/54 , C08L33/10 , C07D327/06 , C07D331/00 , C07D327/00 , C07D335/02 , C09D133/06 , C07D307/20 , C07C323/17 , C07D309/10
Abstract: Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.
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公开(公告)号：US20180203352A1
公开(公告)日：2018-07-19
申请号：US15858129
申请日：2017-12-29
Inventor： Eui Hyun Ryu , Myung-Yeol Kim , Woo-Hyung Lee , Haemi Jeong , Kwang-Hwyi Im
IPC: G03F7/038 , C08L33/10 , C07C69/54 , C07C323/13
CPC classification number: G03F7/0384 , C07C69/54 , C07C323/13 , C07C323/17 , C07C2601/14 , C07D307/20 , C07D309/10 , C07D327/00 , C07D327/06 , C07D331/00 , C07D335/02 , C08L33/10 , C09D133/06 , G03F7/0397
Abstract: Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.
