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公开(公告)号：US11453963B2
公开(公告)日：2022-09-27
申请号：US16571191
申请日：2019-09-16
Applicant: Massachusetts Institute of Technology
Inventor： Jifei Ou , Daniel Oran , Don Haddad
Abstract: A sensor may include a knitted pocket and loose yarn that is inside a cavity of the pocket. In some cases, this loose yarn is neither woven, nor knit, nor otherwise part of a fabric. A resistive pressure sensor may include a knitted pocket and loose conductive yarn that is inside the pocket. Pressure applied to the pocket may compress the loose yarn, which may increase the number of electrical shorts between different parts of the loose yarn, which in turn may decrease the electrical resistance of the loose yarn. A capacitive sensor may include a knitted pocket and insulative loose yarn that is inside the pocket. A strain sensor may include knitted conductive pleats. Electrical shorts may occur in contact areas where neighboring pleats meet. As the strain sensor stretches, these contact areas may become smaller, causing the electrical resistance of the pleats as a group to increase.
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公开(公告)号：US20200087824A1
公开(公告)日：2020-03-19
申请号：US16571191
申请日：2019-09-16
Applicant: Massachusetts Institute of Technology
Inventor： Jifei Ou , Daniel Oran , Don Haddad
Abstract: A sensor may include a knitted pocket and loose yarn that is inside a cavity of the pocket. In some cases, this loose yarn is neither woven, nor knit, nor otherwise part of a fabric. A resistive pressure sensor may include a knitted pocket and loose conductive yarn that is inside the pocket. Pressure applied to the pocket may compress the loose yarn, which may increase the number of electrical shorts between different parts of the loose yarn, which in turn may decrease the electrical resistance of the loose yarn. A capacitive sensor may include a knitted pocket and insulative loose yarn that is inside the pocket. A strain sensor may include knitted conductive pleats. Electrical shorts may occur in contact areas where neighboring pleats meet. As the strain sensor stretches, these contact areas may become smaller, causing the electrical resistance of the pleats as a group to increase.
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公开(公告)号：US11214661B2
公开(公告)日：2022-01-04
申请号：US15261163
申请日：2016-09-09
Applicant: Massachusetts Institute of Technology
Inventor： Samuel G. Rodriques , Daniel Oran , Ruixuan Gao , Shoh Asano , Mark A. Skylar-Scott , Fei Chen , Paul W. Tillberg , Adam H. Marblestone , Edward S. Boyden
Abstract: The present invention enables three-dimensional nanofabrication by isotropic shrinking of patterned hydrogels. A hydrogel is first expanded, the rate of expansion being controlled by the concentration of the crosslinker. The hydrogel is then infused with a reactive group and patterned in three dimensions using a photon beam through a limited-diffraction microscope. Functional particles or materials are then deposited on the pattern. The hydrogel is then shrunk and cleaved from the pattern.
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公开(公告)号：US20170081489A1
公开(公告)日：2017-03-23
申请号：US15261163
申请日：2016-09-09
Applicant: Massachusetts Institute of Technology
Inventor： Samuel G. Rodriques , Daniel Oran , Ruixuan Gao , Shoh Asano , Mark A. Skylar-Scott , Fei Chen , Paul W. Tillberg , Adam H. Marblestone , Edward S. Boyden
CPC classification number: C08J7/123 , B29C35/0805 , B29C2035/0838 , B29K2105/0061 , B33Y80/00 , C08J3/075 , C08J3/28 , C08J7/02 , C08J7/12 , C08J2333/26
Abstract: The present invention enables three-dimensional nanofabrication by isotropic shrinking of patterned hydrogels. A hydrogel is first expanded, the rate of expansion being controlled by the concentration of the crosslinker. The hydrogel is then infused with a reactive group and patterned in three dimensions using a photon beam through a limited-diffraction microscope. Functional particles or materials are then deposited on the pattern. The hydrogel is then shrunk and cleaved from the pattern.
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