公开(公告)号：US20240201606A1

公开(公告)日：2024-06-20

申请号：US18456639

申请日：2023-08-28

Applicant: Kioxia Corporation

Inventor： Masaki MITSUYASU ,  Anupam MITRA ,  Ryo OGAWA

IPC: G03F9/00 ,  G03F7/00 ,  G03F7/20

CPC classification number: G03F9/7042 ,  G03F7/2012 ,  G03F7/70708

Abstract: An imprint apparatus includes: a chuck including a temperature controller configured to adjust a temperature of a substrate having a shot region, the chuck configured to hold the substrate; a template stage configured to hold a template so that a surface of the template with a pattern faces the substrate and configured to change a relative position of the substrate to the template in a vertical direction; and a controller configured to control the chuck and the template stage. The controller is configured to control the temperature controller such that the temperature of the substrate is adjusted based on a magnification error between the pattern and the shot region. The controller controls the template stage such that the pattern is transferred to the shot region of the substrate of which the temperature is adjusted.

公开(公告)号：US20240094624A1

公开(公告)日：2024-03-21

申请号：US18457983

申请日：2023-08-29

Applicant: Kioxia Corporation

Inventor： Masaki MITSUYASU ,  Ryo OGAWA ,  Anupam MITRA

IPC: G03F1/42 ,  G03F7/00 ,  G03F9/00 ,  H01L21/3213

CPC classification number: G03F1/42 ,  G03F7/0002 ,  G03F9/7073 ,  H01L21/32139

Abstract: According to one embodiment, a pattern formation method includes holding a substrate on a suction chuck that an outer suction region for an outer edge portion of the substrate and an inner suction region for an inner region of the substrate. A partial shot region at an outer edge of the substrate has a first alignment mark in the inner region and a second alignment mark at the outer edge portion. While a template is being pressed against a resin film in the shot region, position alignment using the second and fourth alignment marks is performed by adjusting a suction force for the outer suction region for changing a warpage amount of the substrate while observing the second and fourth alignment marks through the template.