公开(公告)号：US20250157781A1

公开(公告)日：2025-05-15

申请号：US18942896

申请日：2024-11-11

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Bjoern Gamm ,  Ken Lagarec ,  Michael W. Phaneuf ,  Pascal Maria Anger

IPC: H01J37/147

Abstract: Operating a particle beam apparatus for imaging, analyzing and/or processing an object includes guiding a particle beam using a first guiding device and a second guiding device in such a way that the particle beam is guided to first positions on a surface of the object. The first positions are arranged along a first geometrical shape on the object. The particle beam is also guided to second positions on the surface of the object using the first guiding device and the second guiding device. The second positions are arranged along a second geometrical shape on the object. Guiding the particle beam along the first geometrical shape and/or along the second geometrical shape is faster in time than guiding the particle beam from the first geometrical shape to the second geometrical shape.

公开(公告)号：US20220367142A1

公开(公告)日：2022-11-17

申请号：US17695879

申请日：2022-03-16

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Preikszas ,  Michael W. Phaneuf

IPC: H01J37/147 ,  H01J37/08 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244

Abstract: The invention relates to a particle beam device (100) for imaging, analyzing and/or processing an object (114). The particle beam device (100) comprises a first particle beam generator (300) for generating a first particle beam, wherein the first particle beam generator (300) has a first generator beam axis (301), wherein an optical axis (OA) of the particle beam device (100) and the first generator beam axis (301) are identical; a second particle beam generator (400) for generating a second particle beam, wherein the second particle beam generator (400) has a second generator beam axis (401), wherein the optical axis (OA) and the second generator beam axis (401) are arranged at an angle being different from 0° and 180°; a deflection unit (500) for deflecting the second particle beam from the second generator beam axis (401) to the optical axis (OA) and along the optical axis (OA), wherein the deflection unit (500) has a first opening (501) and a second opening (502) being different from the first opening (501), wherein the optical axis (OA) runs through the first opening (501), wherein the second generator beam axis (401) runs through the second opening (502); an objective lens (107) for focusing the first particle beam or the second particle beam onto the object (114), wherein the optical axis (OA) runs through the objective lens (107); and at least one detector (116, 121, 122) for detecting interaction particles and/or interaction radiation.

公开(公告)号：US12288664B2

公开(公告)日：2025-04-29

申请号：US17695879

申请日：2022-03-16

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Preikszas ,  Michael W. Phaneuf

IPC: H01J37/147 ,  H01J37/08 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244

Abstract: The invention relates to a particle beam device (100) for imaging, analyzing and/or processing an object (114). The particle beam device (100) comprises a first particle beam generator (300) for generating a first particle beam, wherein the first particle beam generator (300) has a first generator beam axis (301), wherein an optical axis (OA) of the particle beam device (100) and the first generator beam axis (301) are identical; a second particle beam generator (400) for generating a second particle beam, wherein the second particle beam generator (400) has a second generator beam axis (401), wherein the optical axis (OA) and the second generator beam axis (401) are arranged at an angle being different from 0° and 180°; a deflection unit (500) for deflecting the second particle beam from the second generator beam axis (401) to the optical axis (OA) and along the optical axis (OA), wherein the deflection unit (500) has a first opening (501) and a second opening (502) being different from the first opening (501), wherein the optical axis (OA) runs through the first opening (501), wherein the second generator beam axis (401) runs through the second opening (502); an objective lens (107) for focusing the first particle beam or the second particle beam onto the object (114), wherein the optical axis (OA) runs through the objective lens (107); and at least one detector (116, 121, 122) for detecting interaction particles and/or interaction radiation.