公开(公告)号：US20200227294A1

公开(公告)日：2020-07-16

申请号：US16249653

申请日：2019-01-16

Applicant: Applied Materials, Inc.

Inventor： Mingwei ZHU ,  Zihao YANG ,  Nag B. PATIBANDLA ,  Daniel DIEHL ,  Yong CAO ,  Weimin ZENG ,  Renjing ZHENG ,  Edward BUDIARTO ,  Surender Kumar GURUSAMY ,  Todd EGAN ,  Niranjan R. KHASGIWALE

IPC: H01L21/67 ,  G01N21/21 ,  H01L21/687

Abstract: A method and apparatus for forming an optical stack having uniform and accurate layers is provided. A processing tool used to form the optical stack comprises, within an enclosed environment, a first transfer chamber, an on-board metrology unit, and a second transfer chamber. A first plurality of processing chambers is coupled to the first transfer chamber or the second transfer chamber. The on-board metrology unit is disposed between the first transfer chamber and the second transfer chamber. The on-board metrology unit is configured to measure one or more optical properties of the individual layers of the optical stack without exposing the layers to an ambient environment.