公开(公告)号：US20240329322A1

公开(公告)日：2024-10-03

申请号：US18625979

申请日：2024-04-03

Applicant: Applied Materials, Inc.

Inventor： Jinyu LU ,  Ludovic Godet ,  Jinxin FU ,  Kenichi OHNO ,  Shangyi Chen ,  Takashi KURATOMI ,  Erica CHEN ,  Rami HURARNI ,  Yangyang SUN

IPC: G02B6/34 ,  C23C16/40 ,  C23C16/455

CPC classification number: G02B6/34 ,  C23C16/403 ,  C23C16/45553

Abstract: Embodiments described herein relate to improved waveguides with materials layers improving the optical properties of one or more surface regions of waveguides and methods of forming the same. In one embodiment, a waveguide is provided. The waveguide including a substrate, a grating disposed in or on the substrate, the grating comprising a plurality of structures defined by a plurality of trenches, a layer of silicon oxide or aluminum oxide disposed over the structures on the substrate. The layer is disposed over sidewalls and top surfaces of the structures, and a bottom surface of the trenches. The waveguide further includes a high index layer disposed over the layer. The high index layer is disposed over the sidewalls and the top surfaces of the structures, and the bottom surface of the trenches with the layer disposed in between the structures and the high index layer.

公开(公告)号：US20240270007A1

公开(公告)日：2024-08-15

申请号：US18167682

申请日：2023-02-10

Applicant: Applied Materials, Inc.

Inventor： Yingdong LUO ,  Jinyu LU ,  Takashi KURATOMI ,  Alexia Adilene PORTILLO RIVERA ,  Xiaopei DENG ,  Zhengping YAO ,  Daihua ZHANG ,  Rami HOURANI ,  Ludovic GODET

IPC: B41M3/00 ,  B41J11/00 ,  G02B27/01

CPC classification number: B41M3/003 ,  B41J11/00212 ,  G02B27/0172

Abstract: Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to optical devices and methods of manufacturing a patterned optical device film on an optical device substrate. According to certain embodiments, an inkjet deposition process is used to deposit a patterned inkjet coating layer on the optical device substrate. A deposition process may then be used to deposit an optical device material on the patterned inkjet coating and the optical device substrate. The patterned inkjet coating on the optical device substrate may then be washed with an appropriate detergent to lift-off the patterned inkjet coating layer from the optical device substrate to form the patterned optical device film.

公开(公告)号：US20230360890A1

公开(公告)日：2023-11-09

申请号：US18131997

申请日：2023-04-07

Applicant: Applied Materials, Inc.

Inventor： Yue CHEN ,  Jinyu LU ,  Yongmei CHEN ,  Jinxin FU ,  Zihao YANG ,  Mingwei ZHU ,  Takashi KURATOMI ,  Rami HOURANI ,  Ludovic GODET ,  Qun JING ,  Jingyi YANG ,  David Masayuki ISHIKAWA

IPC: H01J37/32 ,  H01J7/02

CPC classification number: H01J37/32449 ,  H01J37/32458 ,  H01J37/32724 ,  H01J7/02 ,  H01J2237/332 ,  H01J2237/334

Abstract: A method of processing an optical device is provided, including: positioning an optical device on a substrate support in an interior volume of a process chamber, the optical device including an optical device substrate and a plurality of optical device structures formed over the optical device substrate, each optical device structure including a bulk region formed of silicon carbide and one or more surface regions formed of silicon oxycarbide. The method further includes providing one or more process gases to the interior volume of the process chamber, and generating a plasma of the one or more process gases in the interior volume for a first time period when the optical device is on the substrate support, and stopping the plasma after the first time period. A carbon content of the one or more surface regions of each optical device structure is reduced by at least 50% by the plasma.