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公开(公告)号：US20190284692A1
公开(公告)日：2019-09-19
申请号：US16356681
申请日：2019-03-18
Applicant: Applied Materials, Inc.
Inventor： Yuriy MELNIK , Sukti CHATTERJEE , Kaushal GANGAKHEDKAR , Jonathan FRANKEL , Lance A. SCUDDER , Pravin K. NARWANKAR , David Alexander BRITZ , David Masayuki ISHIKAWA
IPC: C23C16/455
Abstract: A gas distribution assembly for applying a coating on an interior of a plurality of components includes a support with a plurality of component cavities formed within the support. Each component cavity corresponds to a respective component to fluidly couple with an interior of the respective component. A first gas source flow line is fluidly coupled with each of the component cavities to provide a first gas from a first gas source to each of the component cavities, and a second gas source flow line is fluidly coupled with each of the component cavities to provide a second gas from a second gas source to each of the component cavities.
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公开(公告)号：US20240387792A1
公开(公告)日：2024-11-21
申请号：US18785521
申请日：2024-07-26
Applicant: Applied Materials, Inc.
Inventor： David Masayuki ISHIKAWA , Girish Kumar GOPALAKRISHNAN NAIR , Ezhiylmurugan RANGASAMY , David ALVAREZ , Kent Qiujing ZHAO
Abstract: Metrology systems and processing methods for continuous lithium ion battery (LIB) anode pre-lithiation and solid metal anode protection are provided. In some embodiments, the metrology system integrates at least one complementary non-contact sensor to measure at least one of surface composition, coating thickness, and nanoscale roughness. The metrology system and processing methods can be used to address anode edge quality. The metrology system and methods can facilitate high quality and high yield closed loop anode pre-lithiation and anode protection layer deposition, alloy-type anode pre-lithiation stage control improves LIB coulombic efficiency, and anode coating with pinhole free and electrochemically active protection layers resist dendrite formation.
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3.发明申请METHODS AND APPARATUS FOR PROFILE AND SURFACE PREPARATION OF RETAINING RINGS UTILIZED IN CHEMICAL MECHANICAL POLISHING PROCESSES 审中-公开用于化学机械抛光过程中使用的保持环的剖面和表面准备的方法和装置公开(公告)号：US20160121453A1
公开(公告)日：2016-05-05
申请号：US14879526
申请日：2015-10-09
Applicant: Applied Materials, Inc.
Inventor： David Masayuki ISHIKAWA , Jeonghoon OH , Garrett Ho Yee SIN , Charles C. GARRETSON , Huanbo ZHANG , Chia-Ling PAI , Niraj PRASAD , Julio David MUZQUIZ
IPC: B24B37/32
CPC classification number: B24B37/32
Abstract: A retaining ring for a polishing process is disclosed. The retaining ring includes a body comprising an upper portion and a lower portion, and a sacrificial surface disposed on the lower portion, the sacrificial surface comprising a negative tapered surface having a taper height that is about 0.0003 inches to about 0.00015 inches.
Abstract translation: 公开了一种用于抛光工艺的保持环。 保持环包括包括上部和下部的主体以及设置在下部上的牺牲表面，牺牲表面包括具有约0.0003英寸至约0.00015英寸的锥形高度的负锥形表面。
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公开(公告)号：US20230011303A1
公开(公告)日：2023-01-12
申请号：US17825136
申请日：2022-05-26
Applicant: Applied Materials, Inc.
Abstract: An evaporation system for providing a gas for a reactive deposition process, reactive deposition apparatuses, and methods of reactive deposition are provided. The evaporation system in includes a multi-zone diffuser assembly for single or double-sided continuous roll-to-roll or batch coating of web substrates. The diffuser assembly is sized to accommodate at least a portion of a coating drum. The diffuser assembly includes a plurality of interchangeable solid plates and diffuser plates for delivering an evaporated material toward a web substrate. The diffuser plates are fluidly coupled with an evaporation source.
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5.发明申请公开(公告)号：US20220081763A1
公开(公告)日：2022-03-17
申请号：US17477430
申请日：2021-09-16
Applicant: Applied Materials, Inc.
Inventor： Nitin DEEPAK , Sarin Sundar JAINNAGAR KUPPUSWAMY , Sankalp PATIL , Sukti CHATTERJEE , David Masayuki ISHIKAWA , Prerna Sonthalia GORADIA , David Alexander BRITZ , Lance A. SCUDDER
IPC: C23C16/40 , C23C14/08 , C23C16/455 , F02C6/12
Abstract: Embodiments of the present disclosure generally relate to protective coatings on turbocharger components, such as turbine wheels and compressor wheels, and other rotary equipment components and methods for depositing the protective coatings on such components. In one or more embodiments, a coated turbocharger component is provided and includes a metallic substrate containing a nickel-based alloy or superalloy, a cobalt-based alloy or superalloy, a stainless steel, or a titanium-aluminum alloy and a protective coating disposed on the metallic substrate. The protective coating contains an aluminum oxide having a purity of greater than 99 atomic percent (at %). In some examples, the metallic substrate is a turbine wheel, a compressor wheel, an impeller, a fan blade, a disk, a heat shield, a pulley, or a shaft.
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Patent Agency Ranking
公开(公告)号：US20210062324A1
公开(公告)日：2021-03-04
申请号：US16995662
申请日：2020-08-17
Applicant: Applied Materials, Inc.
Inventor： David Masayuki ISHIKAWA , Jonathan FRANKEL , Joseph YUDOVSKY , David Alexander BRITZ
IPC: C23C14/30 , C23C14/54 , C23C14/52 , H01J37/305
Abstract: Embodiments described herein provide apparatus, software applications, and methods of a coating process, such as an Electron Beam Physical Vapor Deposition (EBPVD) of thermal barrier coatings (TBCs) on objects. The objects may include aerospace components, e.g., turbine vanes and blades, fabricated from nickel and cobalt-based super alloys. The apparatus, software applications, and methods described herein provide at least one of the ability to detect an endpoint of the coating process, i.e., determine when a thickness of a coating satisfies a target value, and the ability for closed-loop control of process parameters.
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公开(公告)号：US20220190306A1
公开(公告)日：2022-06-16
申请号：US17543360
申请日：2021-12-06
Applicant: Applied Materials, Inc.
Inventor： David Masayuki ISHIKAWA , Girish Kumar GOPALAKRISHNAN NAIR , Ezhiylmurugan RANGASAMY , David ALVAREZ , Kent Qiujing ZHAO
Abstract: Metrology systems and processing methods for continuous lithium ion battery (LIB) anode pre-lithiation and solid metal anode protection are provided. In some embodiments, the metrology system integrates at least one complementary non-contact sensor to measure at least one of surface composition, coating thickness, and nanoscale roughness. The metrology system and processing methods can be used to address anode edge quality. The metrology system and methods can facilitate high quality and high yield closed loop anode pre-lithiation and anode protection layer deposition, alloy-type anode pre-lithiation stage control improves LIB coulombic efficiency, and anode coating with pinhole free and electrochemically active protection layers resist dendrite formation.
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公开(公告)号：US20210126247A1
公开(公告)日：2021-04-29
申请号：US17074147
申请日：2020-10-19
Applicant: Applied Materials, Inc.
Inventor： Subramanya P. HERLE , David Masayuki ISHIKAWA
IPC: H01M4/1395 , C23C14/56 , C23C14/24 , C23C14/30 , C23C14/34 , H01M4/38 , H01M4/36 , H01M4/134 , H01M4/62 , H01M4/04 , C23C14/14
Abstract: A method and apparatus for forming an anode electrode structure are provided. The deposition apparatus comprises a first spool chamber capable of housing a storage spool operable to provide the flexible substrate. The deposition apparatus further comprises a first deposition chamber arranged downstream from the first spool chamber. The first deposition chamber comprises a first coating drum capable of guiding the flexible substrate past a first plurality of deposition units capable of depositing lithium metal on the flexible substrate. The deposition apparatus further comprises a second deposition chamber arranged downstream from the first deposition chamber. The second deposition chamber comprises a second coating drum capable for guiding the flexible substrate past a second deposition unit comprising an evaporation crucible capable of depositing a ceramic protective film on the lithium metal film.
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公开(公告)号：US20200290932A1
公开(公告)日：2020-09-17
申请号：US16306171
申请日：2017-06-02
Applicant: APPLIED MATERIALS, INC.
Inventor： David Masayuki ISHIKAWA , Brian H. BURROWS
IPC: C04B35/628 , C23C16/34 , C23C16/04 , C23C16/54 , C04B35/80
Abstract: Methods and apparatus for depositing material on a continuous substrate are provided herein. In some embodiments, an apparatus for processing a continuous substrate includes: a first chamber having a first volume; a second chamber having a second volume fluidly coupled to the first volume; and a plurality of process chambers, each having a process volume defining a processing path between the first chamber and the second chamber, wherein the process volume of each process chamber is fluidly coupled to each other, to the first volume, and to the second volume, and wherein the first chamber, the second chamber, and the plurality of process chambers are configured to process a continuous substrate that extends from the first chamber, through the plurality of process chambers, and to the second chamber.
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公开(公告)号：US20230360890A1
公开(公告)日：2023-11-09
申请号：US18131997
申请日：2023-04-07
Applicant: Applied Materials, Inc.
Inventor： Yue CHEN , Jinyu LU , Yongmei CHEN , Jinxin FU , Zihao YANG , Mingwei ZHU , Takashi KURATOMI , Rami HOURANI , Ludovic GODET , Qun JING , Jingyi YANG , David Masayuki ISHIKAWA
CPC classification number: H01J37/32449 , H01J37/32458 , H01J37/32724 , H01J7/02 , H01J2237/332 , H01J2237/334
Abstract: A method of processing an optical device is provided, including: positioning an optical device on a substrate support in an interior volume of a process chamber, the optical device including an optical device substrate and a plurality of optical device structures formed over the optical device substrate, each optical device structure including a bulk region formed of silicon carbide and one or more surface regions formed of silicon oxycarbide. The method further includes providing one or more process gases to the interior volume of the process chamber, and generating a plasma of the one or more process gases in the interior volume for a first time period when the optical device is on the substrate support, and stopping the plasma after the first time period. A carbon content of the one or more surface regions of each optical device structure is reduced by at least 50% by the plasma.
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