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公开(公告)号：US20240411085A1
公开(公告)日：2024-12-12
申请号：US18208685
申请日：2023-06-12
Applicant: Applied Materials, Inc.
Inventor： Qintao ZHANG , Eric Jay SIMMONS , Mayrita ARRANDALE , Judeth Campbell SOUKUP , David J. LEE , Samphy HONG
Abstract: Disclosed herein are approaches for adjusting local refractive index for photonics IC systems using selective waveguide ion implantation. In one approach, a method may include depositing an optical device film atop a base layer, patterning the optical device film into a plurality of sections, and implanting a first section of the plurality of sections of the optical device film to adjust a refractive index of the first section.
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