公开(公告)号：US20210208083A1

公开(公告)日：2021-07-08

申请号：US17192276

申请日：2021-03-04

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Amo Jan BLEEKER ,  Youri Johannes VAN DOMMELEN ,  Mircea DUSA ,  Antoine Gaston Marie KIERS ,  Paul Frank LUEHRMANN ,  Henricus Petrus Maria PELLEMANS ,  Maurits VAN DER SCHAAR ,  Cédric Désiré GROUWSTRA ,  Markus Geradus Maritinus VAN KRAAIJ

IPC: G01N21/88 ,  G03F7/20 ,  G03F9/00

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.