公开(公告)号：US20230298158A1

公开(公告)日：2023-09-21

申请号：US18017646

申请日：2021-07-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jiao HUANG ,  Jinze WANG ,  Hongfei SHI ,  Mu FENG ,  Qian ZHAO ,  Alvin Jianjiang WANG ,  Yan-Jun XIAO ,  Liang LIU

IPC: G06T7/00 ,  G06T7/13

CPC classification number: G06T7/001 ,  G06T7/13 ,  G06T2207/30168 ,  G06T2207/30148 ,  G06T2207/20216 ,  G06T2207/10061

Abstract: A method for selecting good quality images from raw images of a patterned substrate. The method includes obtaining a plurality of raw images (e.g., SEM images) of a patterned substrate; determining a raw image quality metric (e.g., an image score, an average slope, distance between contours) based on data associated with one or more gauges or one or more contours of one or more features within each image of the plurality of raw images, the raw image quality metric being indicative of a raw image quality; and selecting, based on the raw image quality metric, a sub-set of raw images from the plurality of raw images. The sub-set of raw images can be provided for performing more accurate measurements of the one or more features within an image.