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公开(公告)号：US12204252B2
公开(公告)日：2025-01-21
申请号：US18212334
申请日：2023-06-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Arnaud Hubaux , Johan Franciscus Maria Beckers , Dylan John David Davies , Johan Gertrudis Cornelis Kunnen , Willem Richard Pongers , Ajinkya Ravindra Daware , Chung-Hsun Li , Georgios Tsirogiannis , Hendrik Cornelis Anton Borger , Frederik Eduard De Jong , Juan Manuel Gonzalez Huesca , Andriy Hlod , Maxim Pisarenco
IPC: G03F1/70 , G03F7/00 , G06F30/392
Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.
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公开(公告)号：US20230333482A1
公开(公告)日：2023-10-19
申请号：US18212334
申请日：2023-06-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Arnaud HUBAUX , Johan Franciscus Maria Beckers , Dylan John David Davies , Johan Gertrudis Cornelis Kunnen , Willem Richard Pongers , Ajinkya Ravindra Daware , Chung-Hsun Li , Georgios Tsirogiannis , Hendrik Cornelis Anton Borger , Frederik Eduard De Jong , Juan Manuel Gonzalez Huesca , Andriy Hlod , Maxim Pisarenco
IPC: G03F7/20 , G06F30/392 , G03F1/70
CPC classification number: G03F7/70508 , G06F30/392 , G03F1/70 , G03F7/70616 , G05B2219/45028 , G05B2219/45031
Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.
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公开(公告)号：US11687007B2
公开(公告)日：2023-06-27
申请号：US17423325
申请日：2020-01-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Arnaud Hubaux , Johan Franciscus Maria Beckers , Dylan John David Davies , Johan Gertrudis Cornelis Kunnen , Willem Richard Pongers , Ajinkya Ravindra Daware , Chung-Hsun Li , Georgios Tsirogiannis , Hendrik Cornelis Anton Borger , Frederik Eduard De Jong , Juan Manuel Gonzalez Huesca , Andriy Hlod , Maxim Pisarenco
IPC: G03F1/70 , G03F7/30 , G03F7/00 , G06F30/392
CPC classification number: G03F7/70508 , G03F1/70 , G03F7/70616 , G06F30/392 , G05B2219/45028 , G05B2219/45031
Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.
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公开(公告)号：US11662669B2
公开(公告)日：2023-05-30
申请号：US17625466
申请日：2020-06-15
Applicant: ASML Netherlands B.V.
Inventor： Andrey Valerievich Rogachevskiy , Martin Jules Marie-Emile De Nivelle , Arjan Gijsbertsen , Willem Richard Pongers , Viktor Trogrlic
CPC classification number: G03F9/7092 , G03F7/7085 , G03F9/7026 , G03F9/7034
Abstract: An apparatus for measuring a height of a substrate for processing in a lithographic apparatus is disclosed. The apparatus comprises a first sensor for sensing a height of the substrate over a first area. The apparatus also comprises a second sensor for sensing a height of the substrate over a second area. The apparatus further comprises a processor adapted to normalize first data corresponding to a signal from the first sensor with a second sensor footprint to produce a first normalized height data, and to normalize second data corresponding to a signal from the second sensor with a first sensor footprint to produce a second normalized height data. The processor is adapted to determine a correction to a measured height of the substrate based on a difference between the first and second normalized height data.
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Patent Agency Ranking
公开(公告)号：US20240118584A1
公开(公告)日：2024-04-11
申请号：US18505860
申请日：2023-11-09
Applicant: ASML Netherlands B.V.
IPC: G02F1/35 , G02B6/02 , G02F1/365 , G03F9/00 , G06F30/392 , G06F30/398 , H01S3/067
CPC classification number: G02F1/3528 , G02B6/02328 , G02F1/365 , G03F9/7034 , G06F30/392 , G06F30/398 , H01S3/06741 , G06F2119/18
Abstract: A broadband radiation source device configured for generating a broadband output radiation upon receiving pump radiation, the device including: a hollow-core photonic crystal fiber (HC-PCF) including at least one structurally varied portion having at least one structural parameter of the HC-PCF varied with respect to one or more main portions of the HC-PCF, wherein the at least one structurally varied portion includes at least a structurally varied portion located downstream of a position along the length of the HC-PCF where the pump radiation will be spectrally expanded by a modulation instability dominated nonlinear optical process, and wherein the at least one structurally varied portion is configured and located such that the broadband output radiation includes wavelengths in the ultraviolet region.
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公开(公告)号：US11846867B2
公开(公告)日：2023-12-19
申请号：US17539347
申请日：2021-12-01
Applicant: ASML NETHERLANDS B.V.
IPC: G02F1/35 , G02B6/02 , G02F1/365 , H01S3/067 , G06F30/392 , G06F30/398 , G03F9/00 , G06F119/18
CPC classification number: G02F1/3528 , G02B6/02328 , G02F1/365 , G03F9/7034 , G06F30/392 , G06F30/398 , H01S3/06741 , G06F2119/18
Abstract: A broadband radiation source device configured for generating a broadband output radiation upon receiving pump radiation, the device including: a hollow-core photonic crystal fiber (HC-PCF) including at least one structurally varied portion having at least one structural parameter of the HC-PCF varied with respect to one or more main portions of the HC-PCF, wherein the at least one structurally varied portion includes at least a structurally varied portion located downstream of a position along the length of the HC-PCF where the pump radiation will be spectrally expanded by a modulation instability dominated nonlinear optical process, and wherein the at least one structurally varied portion is configured and located such that the broadband output radiation includes wavelengths in the ultraviolet region.
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公开(公告)号：US11372154B2
公开(公告)日：2022-06-28
申请号：US17128360
申请日：2020-12-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Hendrik Sabert , Patrick Sebastian Uebel , Willem Richard Pongers
Abstract: A hollow-core photonic crystal fiber (HC-PCF) assembly for converting input radiation to broadband radiation, the hollow core fiber assembly including: a micro-structured fiber with a hollow core extending along a length of the fiber from an input end configured to receive input radiation to an output end configured to output broadband radiation, wherein the hollow core of the fiber is configured to include a medium; and a density control system configured to control a density profile of the medium along at least a part of the length of the fiber to establish a desired zero dispersion wavelength profile along at least a part of the length of the fiber.
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公开(公告)号：US20220187680A1
公开(公告)日：2022-06-16
申请号：US17539347
申请日：2021-12-01
Applicant: ASML NETHERLANDS B.V.
IPC: G02F1/35 , G02B6/02 , G02F1/365 , G03F9/00 , G06F30/398 , G06F30/392 , H01S3/067
Abstract: A broadband radiation source device configured for generating a broadband output radiation upon receiving pump radiation, the device including: a hollow-core photonic crystal fiber (HC-PCF) including at least one structurally varied portion having at least one structural parameter of the HC-PCF varied with respect to one or more main portions of the HC-PCF, wherein the at least one structurally varied portion includes at least a structurally varied portion located downstream of a position along the length of the HC-PCF where the pump radiation will be spectrally expanded by a modulation instability dominated nonlinear optical process, and wherein the at least one structurally varied portion is configured and located such that the broadband output radiation includes wavelengths in the ultraviolet region.
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公开(公告)号：US10394143B2
公开(公告)日：2019-08-27
申请号：US15764617
申请日：2016-09-06
Applicant: ASML Netherlands B.V.
Inventor： Nitesh Pandey , Arie Jeffrey Den Boef , Heine Melle Mulder , Willem Richard Pongers , Paulus Antonius Andreas Teunissen
Abstract: A topography measurement system comprising a radiation source configured to generate a radiation beam, a spatially coded grating configured to pattern the radiation beam and thereby provide a spatially coded radiation beam, optics configured to form an image of the spatially coded grating at a target location on a substrate, detection optics configured to receive radiation reflected from the target location of the substrate and form an image of the grating image at a second grating, and a detector configured to receive radiation transmitted through the second grating and produce an output signal.
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