公开(公告)号：US20240152059A1

公开(公告)日：2024-05-09

申请号：US18281519

申请日：2022-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Dogacan KARA ,  Erik JENSEN ,  Jochem Sebastiaan WILDENBERG ,  David Frans Simon DECKERS ,  Sila GULER ,  Reinaldo Antonio ASTUDILLO RENGIFO ,  Yasri YUDHISTIRA ,  Gijs HILHORST ,  David Ricardo CAICEDO FERNANDEZ ,  Frans Reinier SPIERING ,  Sinatra Canggih KHO ,  Herman Martin BLOM ,  Sang Uk KIM ,  Hyun-Su KIM

IPC: G03F7/00

CPC classification number: G03F7/705 ,  G03F7/70633

Abstract: A method for determining a substrate model for describing a first measurement dataset and a second measurement dataset relating to a performance parameter. The method include obtaining candidate basis functions for a plurality of substrate models. Steps 1 to 4 are performed iteratively for the first measurement dataset and the second measurement dataset until at least one stopping criterion is met so as to determine the substrate model, the steps including: 1. selecting a candidate basis function from the candidate basis functions; 2. updating a substrate model by adding the candidate basis function into this substrate model to obtain an updated substrate model; 3. evaluating the updated substrate model based on the first measurement dataset and/or second measurement dataset; and 4. determining whether to include the basis function within the substrate model based on the evaluation.

公开(公告)号：US20220334503A1

公开(公告)日：2022-10-20

申请号：US17640880

申请日：2020-08-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Yingchao CUI ,  Hadi YAGUBIZADE ,  Xiuhong WEI ,  Daan Maurits SLOTBOOM ,  Jeonghyun PARK ,  Sarathi ROY ,  Yichen ZHANG ,  Mohammad Reza KAMALI ,  Sang Uk KIM

IPC: G03F7/20

Abstract: A method for determining lithographic matching performance includes obtaining first monitoring data from recurrent monitoring for stability control for an available EUV scanner. For a DUV scanner, second monitoring data is similarly obtained from recurrent monitoring for stability control. The EUV first monitoring data are in a first layout. The DUV second monitoring data are in a second layout. A cross-platform overlay matching performance between the first lithographic apparatus and the second lithographic apparatus is determined based on the first monitoring data and the second monitoring data. This is done by reconstructing the first and/or second monitoring data into a common layout to allow comparison of the first and second monitoring data.