公开(公告)号：US20210349397A1

公开(公告)日：2021-11-11

申请号：US17273758

申请日：2019-08-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Raphael Nico Johan STEGEN ,  Erik Henricus Egidius Catharina EUMMELEN ,  Christianus Wilhelmus Johannes BERENDSEN ,  Theodorus Wilhelmus POLET ,  Giovanni Luca GATTOBIGIO

IPC: G03F7/20 ,  G01N21/88

Abstract: A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.

公开(公告)号：US20210191275A1

公开(公告)日：2021-06-24

申请号：US16767987

申请日：2018-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Raphael Nico Johan STEGEN ,  Giovanni Luca GATTOBIGIO ,  Theodorus Wilhelmus POLET

IPC: G03F7/20

Abstract: A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure having an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and having an inner part and an outer part, wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.