公开(公告)号：US20200050116A1

公开(公告)日：2020-02-13

申请号：US16657267

申请日：2019-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert STAVENGA ,  Sergei SHULEPOV ,  Koen STEFFENS ,  Matheus Ana Karel VAN LIEROP ,  Samuel Bertrand Dominique DAVID ,  David BESSEMS

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/68

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.