公开(公告)号：US20180364590A1

公开(公告)日：2018-12-20

申请号：US16061236

申请日：2016-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Maurits VAN DER SCHAAR ,  Patrick WARNAAR ,  Youping ZHANG ,  Arie Jeffrey DEN BOEF ,  Feng XIAO ,  Martin EBERT

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/88

Abstract: A method includes projecting an illumination beam of radiation onto a metrology target on a substrate, detecting radiation reflected from the metrology target on the substrate, and determining a characteristic of a feature on the substrate based on the detected radiation, wherein a polarization state of the detected radiation is controllably selected to optimize a quality of the detected radiation.

公开(公告)号：US20180046737A1

公开(公告)日：2018-02-15

申请号：US15559759

申请日：2016-03-24

Applicant: ASML Netherlands B.V.

Inventor： Lotte Marloes WILLEMS ,  Kaustuve BHATTACHARYYA ,  Panagiotis Peter BINTEVINOS ,  Guangqing CHEN ,  Martin EBERT ,  Pieter Jacob Mathias Hendrik KNELISSEN ,  Stephen MORGAN ,  Maurits VAN DER SCHAAR ,  Leonardus Hericus Marie VERSTAPPEN ,  Jen-Shiang WANG ,  Peter Hanzen WARDENIER

IPC: G06F17/50 ,  G03F7/20

CPC classification number: G06F17/5009 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7046 ,  G06F2217/16

Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.

公开(公告)号：US20190072859A1

公开(公告)日：2019-03-07

申请号：US16117614

申请日：2018-08-30

Applicant: ASML Netherlands B.V.

Inventor： Martin Jacobus Johan JAK ,  Martin EBERT ,  Arie Jeffrey DEN BOEF ,  Nitesh PANDEY

IPC: G03F7/20

Abstract: A method comprising: evaluating a plurality of polarization characteristics associated with measurement of a metrology target of a substrate processed using a patterning process, against one or more measurement quality parameters; and selecting one or more polarization characteristics from the plurality of polarization characteristics based on one or more of the measurement quality parameters

公开(公告)号：US20230207255A1

公开(公告)日：2023-06-29

申请号：US18117373

申请日：2023-03-03

Applicant: ASML Netherlands B.V.

Inventor： Vincent Claude BEUGIN ,  Stijn Wilem Herman Karel STEENBRINK ,  Martin EBERT ,  Diego MARTINEZ NEGRETE GASQUE ,  Hindrik Willem MOOK ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/28

Abstract: Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.

公开(公告)号：US20210055663A1

公开(公告)日：2021-02-25

申请号：US17081325

申请日：2020-10-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Maurits VAN DER SCHAAR ,  Patrick WARNAAR ,  Youping ZHANG ,  Arie Jeffrey DEN BOEF ,  Feng XIAO ,  Martin EBERT

IPC: G03F7/20 ,  G03F9/00

Abstract: A method includes projecting an illumination beam of radiation onto a metrology target on a substrate, detecting radiation reflected from the metrology target on the substrate, and determining a characteristic of a feature on the substrate based on the detected radiation, wherein a polarization state of the detected radiation is controllably selected to optimize a quality of the detected radiation.

公开(公告)号：US20170184977A1

公开(公告)日：2017-06-29

申请号：US15387431

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Martin Jacobus Johan JAK ,  Arie Jeffrey DEN BOEF ,  Martin EBERT

IPC: G03F7/20 ,  G01N21/95 ,  G01B11/26

CPC classification number: G03F7/70191 ,  G01B11/26 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/9501 ,  G02B5/1819 ,  G02B5/1823 ,  G02B27/4255 ,  G02B27/4272 ,  G03F7/70616 ,  G03F7/70633 ,  G03F7/70683 ,  G03F7/7085 ,  G03F9/7049 ,  G03F9/7076

Abstract: A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.