公开(公告)号：US20230314930A1

公开(公告)日：2023-10-05

申请号：US18022476

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Paul Alexander VERMEULEN ,  Cornelis Adrianus DE MEIJERE ,  Johnnes Hubertus Josephina MOORS ,  Andrey NIKIPELOV ,  Guido SALMASO ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC: G03F1/64 ,  G03F7/20

CPC classification number: G03F1/64 ,  G03F7/70983

Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly, the apparatus including: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.