公开(公告)号：US20160140267A1

公开(公告)日：2016-05-19

申请号：US14941347

申请日：2015-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Guangqing CHEN ,  Shufeng BAI ,  Eric Richard KENT ,  Yen-Wen LU ,  Paul Anthony TUFFY ,  Jen-Shiang WANG ,  Youping ZHANG ,  Gertjan ZWARTJES ,  Jan Wouter BIJLSMA

IPC: G06F17/50 ,  G03F7/20

CPC classification number: G06F17/5009 ,  G03F7/705 ,  G03F7/70633 ,  G03F7/70683 ,  G06F17/12 ,  G06F17/14

Abstract: Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than “building” the device geometry element-by-element.

Abstract translation: 用于自动生成稳健计量目标的方法和系统，可以适应各种光刻过程和过程扰动。 整个光刻过程的各个步骤被建模成单个过程序列以模拟物理衬底处理。 该过程顺序驱动了整体的三维设备几何的创建，而不是逐个“构建”设备几何。