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公开(公告)号:US20240004282A1
公开(公告)日:2024-01-04
申请号:US18255695
申请日:2021-12-15
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor: Martin B. Wolk , Robert L. Brott , Kevin W. Gotrik , Christopher S. Lyons , Caleb T. Nelson , Vadim Savvateev , James M. Nelson , Craig R. Schardt , Jeffrey L. Solomon , Karl K. Stensvad , Steven D. Theiss
CPC classification number: G03F1/20 , G03F7/094 , G03F7/36 , G02B6/02085
Abstract: A structured film for forming a pattern on a substrate includes a polymeric support layer, an adhesive layer, an etch resist layer disposed between the polymeric support layer and the adhesive layer, a structured resin layer disposed between the polymeric support layer and the etch resist layer, and one or more unstructured layers disposed between the etch resist layer and the adhesive layer. The structured resin layer has a structured major surface including a plurality of engineered structures. The etch resist layer at least partially fills spaces between adjacent engineered structures to substantially planarize the structured major surface. Methods of using the structured film to form a pattern on a substrate are described.
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公开(公告)号:US20240004110A1
公开(公告)日:2024-01-04
申请号:US18255736
申请日:2021-12-15
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor: Martin B. Wolk , Robert L. Brott , Kevin W. Gotrik , Christopher S. Lyons , Caleb T. Nelson , Vadim Savvateev , James M. Nelson , Craig R. Schardt , Jeffrey L. Solomon , Karl K. Stensvad
IPC: G02B5/18
CPC classification number: G02B5/1857 , G02B5/1809
Abstract: An optical article includes a waveguide and a structured film. The structured film includes a polymeric substrate, an etch stop layer disposed on the polymeric substrate, a structured layer including a plurality of engineered structures disposed on a side of the etch stop layer opposite the polymeric substrate, a planarizing backfill layer disposed over the plurality of engineered structures to define a substantially planar major surface of the planarizing backfill layer having a surface roughness Ra, and an adhesive layer disposed on the substantially planar surface of the planarizing backfill layer and bonding the structured film to the waveguide. A difference in index of refraction of the planarizing backfill layer and the structured layer is at least 0.25 for at least a first wavelength W1 in a range of 400 nm to 2500 nm. The adhesive layer has an average thickness ta where Ra
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