Layered structures on thin substrates
    1.
    发明授权
    Layered structures on thin substrates 有权
    薄基底上的分层结构

    公开(公告)号:US08637138B2

    公开(公告)日:2014-01-28

    申请号:US11318975

    申请日:2005-12-27

    IPC分类号: B41M5/52 G01K17/00 G01K7/24

    摘要: A thin substrate has a layered structure on one surface, and can also have a layered structure on the other. Each layered structure can include a part of at least one patterned layer that, if patterned by photolithography, would frequently result in damage to the substrate due to fragility. For example, the substrate could be a 3 mil (76.2 μm) or thinner polyimide film and one patterned layer could be a semiconductor material such as vanadium oxide, while another could be metal in electrical contact with semiconductor material. The layer part, however, can be patterned by a printing operation or can include a printed patterned artifact such as an uneven boundary or an alignment. The printing operation can be direct printing or printing of a mask for etching or liftoff or both. The layered structure can include an array of cells, each with layer parts on each substrate surface.

    摘要翻译: 薄基板在一个表面上具有层状结构,并且另外可以具有层状结构。 每个分层结构可以包括至少一个图案化层的一部分,如果通过光刻图案,则会由于脆性而频繁地导致对基底的损伤。 例如,衬底可以是3密耳(76.2μm)或更薄的聚酰亚胺膜,并且一个图案化层可以是诸如氧化钒的半导体材料,而另一个可以是与半导体材料电接触的金属。 然而,层部分可以通过打印操作来图案化,或者可以包括印刷的图案化伪像,例如不均匀边界或对准。 打印操作可以是直接打印或打印用于蚀刻或剥离的掩模或两者。 层状结构可以包括每个在每个衬底表面上具有层部分的单元阵列。