公开(公告)号：US06134012A

公开(公告)日：2000-10-17

申请号：US345560

申请日：1999-06-30

Applicant: David E. Aspnes ,  Jon Opsal

Inventor： David E. Aspnes ,  Jon Opsal

IPC: G01N21/21 ,  G01B11/06 ,  G01J3/02 ,  G01J3/447 ,  G01J4/00 ,  G01J4/04 ,  G02F1/01

CPC classification number: G01J3/02 ,  G01J3/0229 ,  G01J3/0232 ,  G01N21/211 ,  G01N2021/213

Abstract: An ellipsometer, and a method of ellipsometry, for analyzing a sample using a broad range of wavelengths, includes a light source for generating a beam of polychromatic light having a range of wavelengths of light for interacting with the sample. A polarizer polarizes the light beam before the light beam interacts with the sample. A rotating compensator induces phase retardations of a polarization state of the light beam wherein the range of wavelengths and the compensator are selected such that at least a first phase retardation value is induced that is within a primary range of effective retardations of substantially 135.degree. to 225.degree., and at least a second phase retardation value is induced that is outside of the primary range. An analyzer interacts with the light beam after the light beam interacts with the sample. A detector measures the intensity of light after interacting with the analyzer as a function of compensator angle and of wavelength, preferably at all wavelengths simultaneously. A processor determines the polarization state of the beam as it impinges the analyzer from the light intensities measured by the detector.

Abstract translation: 用于使用宽波长范围分析样品的椭偏仪的椭偏仪和椭偏仪的方法包括用于产生具有用于与样品相互作用的光波长范围的多色光束的光源。 在光束与样品相互作用之前，偏振器使光束偏振。 旋转补偿器引起光束的偏振状态的相位延迟，其中波长范围和补偿器被选择为使得至少第一相位延迟值被诱导为在大约135°至225°的有效延迟的主要范围内 DEG，并且诱导超出初级范围的至少第二相延迟值。 在光束与样品相互作用后，分析仪与光束相互作用。 检测器测量与分析仪相互作用后的光强度，作为补偿器角度和波长的函数，优选同时在所有波长处。 处理器确定当光束从由检测器测量的光强度撞击分析仪时的偏振状态。

公开(公告)号：US5953446A

公开(公告)日：1999-09-14

申请号：US169753

申请日：1998-10-09

Applicant: Jon Opsal ,  John J. Sidorowich

Inventor： Jon Opsal ,  John J. Sidorowich

IPC: G01B11/06 ,  G01N21/84 ,  G01N21/88 ,  H01L21/66 ,  G06K9/00 ,  G01N21/86 ,  G06F15/18

CPC classification number: G01N21/8422

Abstract: An optical inspection device generates a plurality of measured optical data from inspection of a thin film stack. A processor evolves models of theoretical data, which are compared to the measured data, and a "best fit" solution is provided as the result. Each model of theoretical data is represented by an underlying "genotype" which is an ordered list of "genes." Each gene corresponds to a selected thin film parameter of interest. Many such individual genotypes are created thereby forming a "population" of genotypes, which are evolved through the use of a genetic algorithm. Each genotype has a fitness associated therewith based on how much the theoretical data derived therefrom differs from the measured data. Individual genotypes are selected based on fitness, then a genetic operation is performed on the selected genotypes to produce new genotypes. Multiple generations of genotypes are evolved until an acceptable solution is obtained.

Abstract translation: 光学检查装置从薄膜叠层的检查产生多个测量的光学数据。 处理器演变了与测量数据进行比较的理论数据模型，并提供了“最佳拟合”解决方案。 理论数据的每个模型都是由“基因”的有序列表的基础“基因型”来表示的。 每个基因对应于所选的薄膜参数。 由此形成许多这样的个体基因型，从而形成基因型的“群体”，其通过使用遗传算法而演变。 基于从其导出的理论数据与测量数据的多少，每个基因型具有与其相关联的适应度。 基于适应度选择个体基因型，然后对所选择的基因型进行遗传操作以产生新的基因型。 发展多代基因型，直到获得可接受的解决方案。

公开(公告)号：US4522510A

公开(公告)日：1985-06-11

申请号：US481275

申请日：1983-04-01

Applicant: Allan Rosencwaig ,  Jon Opsal

Inventor： Allan Rosencwaig ,  Jon Opsal

IPC: G01B11/06 ,  G01N21/17 ,  G01N25/00 ,  G01N25/16 ,  G01N25/18 ,  G01N21/41 ,  G01N25/72

CPC classification number: G01N25/00 ,  G01B11/0666 ,  G01N21/171

Abstract: A method and apparatus for thin film thickness measurements with thermal waves in which heating and detection laser beams are focused onto the film, normal to the surface of the film, with the two beams parallel and non-coaxial.

Abstract translation: 一种用于利用热波进行薄膜厚度测量的方法和装置，其中加热和检测激光束垂直于膜的表面聚焦在膜上，两个光束平行和非同轴。

公开(公告)号：US07982867B2

公开(公告)日：2011-07-19

申请号：US12767339

申请日：2010-04-26

Applicant: Alex Salnik ,  Jon Opsal ,  Lena Nicolaides

Inventor： Alex Salnik ,  Jon Opsal ,  Lena Nicolaides

IPC: G01N21/00

CPC classification number: G01N21/1717 ,  G01N2021/1719 ,  G01N2021/178

Abstract: Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile.

Abstract translation: 使用调制光学反射率（MOR）测量公开了获得掺杂剂和损伤深度分布信息的方法。 在一个方面，使用从诸如结深度，结突起和掺杂剂浓度的各种测量获得的信息来构建深度分布。 另一方面，开发了一个完整的理论模型。 实际测量被馈送到模型。 使用迭代方法，将实际测量与从模型计算的理论测量值进行比较，以确定实际深度分布。

公开(公告)号：US07933026B2

公开(公告)日：2011-04-26

申请号：US12486830

申请日：2009-06-18

Applicant: Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

Inventor： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

IPC: G01B11/14 ,  G01N21/00

CPC classification number: G01B11/0641

Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

公开(公告)号：US20090066954A1

公开(公告)日：2009-03-12

申请号：US12288395

申请日：2008-10-20

Applicant: Jon Opsal

Inventor： Jon Opsal

IPC: G01J4/00

CPC classification number: G01B11/0641 ,  G01J4/04 ,  G01N21/211 ,  G01N2021/213

Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.

Abstract translation: 公开了一种用于从样品获得椭偏测量的装置。 探针光束聚焦在样品上以产生入射角的扩展。 光束通过四分之一波片延迟器和偏振器。 反射光束由检测器测量。 在一个优选实施例中，检测器包括八个径向布置的段，每个段产生表示多个入射角的积分的输出。 处理器处理来自各个段的输出以导出椭偏信息。

公开(公告)号：US07499168B2

公开(公告)日：2009-03-03

申请号：US11656610

申请日：2007-01-23

Applicant: Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

Inventor： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

IPC: G01N21/00

CPC classification number: G01N21/1717 ,  G01N21/55 ,  G01N2021/1719

Abstract: A metrology tool for semiconductor wafers is disclosed which combines modulated reflectivity measurement with junction photovoltage measurements. The tool includes an intensity modulated pump beam for periodically exciting the sample. A separate probe beam is used to monitor changes in optical reflectivity of the sample. In addition, capacitive electrodes are provided to measure modulated changes in the voltage across the electrodes. These measurements are combined to evaluate the wafer. These measurement can be particularly useful in characterizing ultrashallow junctions.

Abstract translation: 公开了一种用于半导体晶片的计量工具，其将调制反射率测量与结光电压测量相结合。 该工具包括用于周期性激发样品的强度调制泵浦光束。 单独的探针光束用于监测样品光学反射率的变化。 此外，提供电容电极以测量电极两端的电压的调制变化。 将这些测量结合起来以评估晶片。 这些测量在表征超小结点方面特别有用。

公开(公告)号：US07436527B2

公开(公告)日：2008-10-14

申请号：US11732125

申请日：2007-04-02

Applicant: Jon Opsal

Inventor： Jon Opsal

IPC: G01B11/28 ,  G01B11/06

CPC classification number: G01N21/211 ,  G01B11/0641 ,  G01B2210/56

Abstract: Fluid immersion technology can be utilized to increase the resolution and angular range of existing metrology systems. An immersion fluid placed between the metrology optics and the sample can reduce the refraction at the sample interface, thereby decreasing the spot size of the beam on a feature of the sample while simultaneously increasing the angular range of the system. The decreased spot size, in combination with an increased angular spread, allows an existing metrology system to measure parameters of a sample, such as a semiconductor or microelectronic device, with improved resolution and without expensive and/or complex changes to the mechanics of the metrology system.

公开(公告)号：US07330260B2

公开(公告)日：2008-02-12

申请号：US11067961

申请日：2005-02-28

Applicant: Lena Nicolaides ,  Mira Bakshi ,  Alex Salnik ,  Jon Opsal

Inventor： Lena Nicolaides ,  Mira Bakshi ,  Alex Salnik ,  Jon Opsal

IPC: G01J4/00

CPC classification number: G01N21/171 ,  H01L22/12

Abstract: The repeatability of wafer uniformity measurements can be increased by taking spatially averaged measurements of wafer response. By increasing the time over which measurements are obtained, the amount of noise can be significantly reduced, thereby improving the repeatability of the measurements. These measurements can be taken at several locations on the wafer to ensure wafer uniformity. In order to get a stable and repeatable assessment of the wafer process, addressing uncertainties related to damage relaxation or incomplete anneal, an anneal decay factor (ADF) characterization can be performed at a distance away from the TW measurement boxes. From the ADF measurement and the spatially averaged measurements of wafer response, a repeatable assessment of the wafer process can be obtained.

Abstract translation: 通过采用晶圆响应的空间平均测量可以提高晶片均匀性测量的重复性。 通过增加获得测量的时间，可以显着降低噪声量，从而提高测量的重复性。 这些测量可以在晶片上的几个位置进行，以确保晶片的均匀性。 为了获得对晶圆工艺的稳定和可重复的评估，解决与损伤弛豫或不完全退火有关的不确定性，可以在远离TW测量箱的距离处执行退火衰减因子（ADF）表征。 从ADF测量和晶片响应的空间平均测量，可以获得晶片工艺的可重复评估。

公开(公告)号：US07280215B2

公开(公告)日：2007-10-09

申请号：US10947925

申请日：2004-09-23

Applicant: Alex Salnik ,  Jon Opsal ,  Lena Nicolaides

Inventor： Alex Salnik ,  Jon Opsal ,  Lena Nicolaides

IPC: G01N21/55

CPC classification number: G01N21/9501 ,  G01N21/1717 ,  G01N21/636

Abstract: The ability of a Modulated Optical Reflectivity (MOR) or Thermal Wave (TW) system to measure characteristics of a sample based on the amplitude and phase of a probe beam reflected from the surface of the sample can be improved by providing a polychromatic pump and/or probe beam that can be scanned over a wide spectral range, such as a range of at least 100 nm. The information contained in the spectral dependencies of a TW response obtained from the sample can be compared and/or fitted to corresponding theoretical dependencies in order to obtain more precise and reliable information about the properties of the particular sample than is available for single-wavelength systems. This information can further be combined with measurements taken for varying spot separations or varying pump source modulation frequency, as well as with photo-thermal radiometry (PTR), spectroscopic reflectometry, and/or ellipsometry measurements.

Abstract translation: 基于从样品表面反射的探针光束的幅度和相位，调制光学反射率（MOR）或热波（TW）系统测量样品的特性的能力可以通过提供多色泵和/ 或可以在宽光谱范围（例如至少100nm的范围）上扫描的探测光束。 包含在从样本获得的TW响应的频谱相关性中的信息可以与相应的理论依赖性进行比较和/或拟合，以获得关于特定样品的性质的更精确和可靠的信息，而不是可用于单波长系统 。 该信息可以进一步与用于变化的点分离或变化的泵浦源调制频率以及光热辐射测量（PTR），光谱反射测量和/或椭偏仪测量的测量结合。