-
公开(公告)号：US20220379580A1
公开(公告)日：2022-12-01
申请号：US17755833
申请日：2020-10-16
申请人： SEIREN CO., LTD.
发明人： Naozumi FUWA
摘要： A seat skin 11 has a front surface layer 12, a back surface layer 13, and pores 15. The inner wall of the pore 15 is covered by the front surface layer 12. The seat skin 11 is produced by forming a base material having at least a front surface layer 12 and a back surface layer 13; sandwiching the base material between a pressing plate having a die for the pores, and a backing plate opposite the pressing plate; pressing the pressing plate against the backing plate with the base material being heated at a temperature that a component contained in the front surface layer 12 does not melt, to form the pores in the base material; and removing the base material having the pores formed therein from between the pressing plate and the backing plate.
-
公开(公告)号：US20220373883A1
公开(公告)日：2022-11-24
申请号：US17883422
申请日：2022-08-08
发明人： Roman GOUK , Jean DELMAS , Steven VERHAVERBEKE , Chintan BUCH
摘要： An imprint lithography stamp includes a stamp body having a patterned surface and formed from a fluorinated ethylene propylene copolymer. The imprint lithography stamp further includes a backing plate with a plurality of through-holes with portions of the stamp body extending into the through-holes to adhere the stamp body to the backing plate. The patterned surface of the stamp body has a plurality of protrusions extending from the stamp body, which are used to form high aspect ratio features at high processing temperatures. A mold design for forming the imprint lithography stamp and an injection molding process for forming the imprint lithography stamp are also provided.
-
公开(公告)号：US20220371263A1
公开(公告)日：2022-11-24
申请号：US17754005
申请日：2020-09-09
申请人： BASF COATING GMBH
发明人： Sven Olle KRABBENBORG , Tim BUSCHER
IPC分类号： B29C59/02
摘要： Described herein is a process for producing a structured article (A1M1) in which a material (M1) including at least one micro- and/or nanostructured surface (SU1) containing a plurality of micro-scale and/or nano-scale surface elements is covered with an at least partially cured coating layer (C2) to provide a composite (M1C2), said composite (M1C2) is attached to an object (A1) and the coating layer (C2) is at least partially peeled off to provide the structured article (A1M1). Also described herein is a composite (M1C2) in which the surface elements of the material (M1) are covered by a protective coating layer (C2).
-
54.发明授权公开(公告)号：US11480871B2
公开(公告)日：2022-10-25
申请号：US16834386
申请日：2020-03-30
摘要： An imprint apparatus is provided. The imprint apparatus includes an imprint head, at least one cable assembly configured to supply a signal to the imprint head, and a cable assembly sensor configured to detect a state of the at least one cable assembly. The signal may include one or more of a voltage signal, a current signal, and a pneumatic signal. The cable assembly sensor may include a strain gauge configured to measure a strain of the at least one cable assembly or a load cell configured to measure a force on the at least one cable assembly. For example, the cable assembly may include an electric wire and/or a gas supply tube.
-
公开(公告)号：US11458670B2
公开(公告)日：2022-10-04
申请号：US16807502
申请日：2020-03-03
申请人： SEIREN CO., LTD.
发明人： Shigeru Nakajima , Nobuyuki Aoki
摘要： An embossing die is provided to an embossing apparatus. The embossing die is heated by a heating unit which is provided to the embossing apparatus. The embossing die includes a convex shaped mold portion. The mold portion corresponds to one concave portion formed on a front face of a base material. The mold portion is an aggregate of a plurality of protrusions which are divided by a slit. The slit is provided to an outer surface of the mold portion which contacts the front face of the base material. In the slit, a cutting direction corresponds to a height direction of the mold portion. The plurality of protrusions are adjacent to each other through the slit.
-
公开(公告)号：US20220308445A1
公开(公告)日：2022-09-29
申请号：US17215630
申请日：2021-03-29
发明人： Teresa Perez Estrada
摘要： A shaping system and method of using the shaping system. The shaping system may comprise a radiation source; a template chuck configured to hold a template; and an optical diaphragm positioned between the template chuck and the radiation source. The optical diaphragm may have a plurality of blades. Each blade has a cutout in an edge of each blade. Edges and cutouts of the plurality of blades may form an opening which actinic radiation from the radiation source passes through.
-
公开(公告)号：US11440240B2
公开(公告)日：2022-09-13
申请号：US16667414
申请日：2019-10-29
发明人： Joey L. Mead , Carol M. F. Barry , John Shearer , Artee Panwar , Jinde Zhang , Nischay Kodihalli Shivaprakash
IPC分类号： B29C59/02 , B29C59/04 , G03F7/00 , B29K101/12 , B29K105/00
摘要： Methods and systems for manufacturing re-entrant structures, such as the structures exhibiting superomniphobic characteristic, in a continuous, well-controlled, high-rate (mass production, volume) manner are disclosed.
-
公开(公告)号：US11429022B2
公开(公告)日：2022-08-30
申请号：US16661461
申请日：2019-10-23
摘要： Systems and methods for shaping a film. Formable material in an imprint field on the substrate may be contacted with a shaping surface of a template. Outer boundaries of the imprint field correspond to outer boundaries of the shaping surface. Shaping the film includes forming a cured layer within the imprint field while the shaping surface is in contact with the formable material. Shaping the film may include separating the shaping surface from the cured layer. Shaping the film may include moving the template away from the imprint field to a first offset location wherein the outer boundaries of the shaping surface are offset relative to the outer boundaries of the imprint field. Shaping the film may include curing a second portion of the formable material while the template is at the first offset location so as to form the shaped film.
-
公开(公告)号：US11426906B2
公开(公告)日：2022-08-30
申请号：US16413488
申请日：2019-05-15
发明人： Naoki Murasato , Ken Minoda
IPC分类号： B29C43/56 , G03F7/00 , G03F9/00 , B29C59/02 , H01L21/027
摘要： An imprint apparatus cures an imprint material by irradiating the imprint material with light while the imprint material on a substrate is in contact with a pattern region of a mold. The imprint apparatus includes a first supply unit configured to supply a first gas to a gap between the substrate and the mold, the first gas accelerating filling of recessed portions of the pattern region with the imprint material, and a second supply unit configured to supply a second gas to the gap, the second gas inhibiting curing of the imprint material.
-
公开(公告)号：US11422462B2
公开(公告)日：2022-08-23
申请号：US16892389
申请日：2020-06-04
发明人： Takahiro Sato
IPC分类号： G03F7/00 , H01L21/687 , H01L21/683 , G03F7/20 , B29C59/02 , B29C59/00 , B82Y40/00
摘要： A forming apparatus includes a substrate holder having a plurality of chucking regions that chuck a lower surface of the substrate and configured to hold the substrate by chucking the substrate with the plurality of chucking regions, and a controller configured to control execution of a forming process and independently control a chucking force of each of the plurality of chucking regions. The controller controls a chucking force of each of the plurality of chucking regions in a mold separation step so as to make a final mold separation point, at which the mold finally separates from the composition, coincide with a center of a pattern surface of the mold.
-
-
-
-
-
-
-
-
-
搜索结果
3604 条记录 (耗时 0.031 秒)
