Donor substrate and method of forming transfer pattern using the same
    51.
    发明授权
    Donor substrate and method of forming transfer pattern using the same 有权
    供体基体和使用其形成转移图案的方法

    公开(公告)号:US08921129B2

    公开(公告)日:2014-12-30

    申请号:US14061961

    申请日:2013-10-24

    Abstract: A donor substrate includes a base substrate; a light reflection layer on the base substrate and partially overlapping the base substrate; a light-to-heat conversion layer on the base substrate, and including a combination layer including an insulating material and a first metal material; and a transfer layer on the light-to-heat conversion layer. A ratio of the first metal material in the combination layer to the insulating material in the combination layer increases as a distance from the base substrate increases along a thickness direction of the light-to-heat conversion layer.

    Abstract translation: 供体衬底包括基底; 基底基板上的光反射层,并与基底部分重叠; 基底基板上的光热转换层,并且包括包含绝缘材料和第一金属材料的组合层; 以及在光热转换层上的转印层。 组合层中的第一金属材料与组合层中的绝缘材料的比例随着与基底基板的距离沿着光热转换层的厚度方向增加而增加。

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