公开(公告)号：US20140375974A1

公开(公告)日：2014-12-25

申请号：US14372950

申请日：2013-01-10

Applicant: ASML Netherlands B.V.

Inventor： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Vladimir Mihailovitch Krivtsun ,  Gerardus Hubertus Petrus Maria Swinkels ,  Michel Riepen ,  Hendrikus Gijsbertus Schimmel ,  Viacheslav Medvedev

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70166 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70916 ,  G21K1/067 ,  G21K2201/064 ,  H05G2/008

Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma-forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.

Abstract translation: 源极 - 集电极器件被构造和布置成产生辐射束。该器件包括构造和布置成呈现等离子体形成材料的目标表面的靶单元; 激光单元，其被构造和布置成产生被引导到所述目标表面上的辐射束，以便形成来自所述等离子体形成材料的等离子体; 构造和布置以减少由等离子体产生的颗粒污染物的传播的污染物阱; 辐射收集器，包括多个放射入射反射器，其布置成收集由等离子体发射的辐射并从其形成光束; 以及被构造和布置成衰减所述光束的至少一个波长范围的滤光器。

公开(公告)号：US08742381B2

公开(公告)日：2014-06-03

申请号：US13774612

申请日：2013-02-22

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

IPC: G03F7/20 ,  B08B7/00 ,  G01J3/10

CPC classification number: G03F7/70925

Abstract: A radiation source includes an uncapped Mo/Si multilayer mirror, and a cleaning apparatus configured to remove a deposition comprising Sn on the uncapped Mo/Si multilayer mirror. The cleaning apparatus is configured to provide a gas comprising one or more of H2, D2 and HD and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the radiation source, to produce hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas, and to supply the hydrogen and/or deuterium radicals and radicals of the one or more additional compounds to the uncapped Mo/Si multilayer mirror to remove at least part of the deposition.

Abstract translation: 辐射源包括未加盖的Mo / Si多层反射镜，以及被配置为去除未开盖的Mo / Si多层反射镜上的包含Sn的沉积物的清洁装置。 清洁装置被配置为在至少部分辐射源中提供包含H2，D2和HD中的一种或多种的气体和一种或多种选自烃化合物和/或硅烷化合物的其它化合物，以产生氢和/或氘 来自气体的一种或多种另外的化合物的自由基和基团，并且将一种或多种另外的化合物的氢和/或氘自由基和自由基供应到未开孔的Mo / Si多层反射镜，以去除至少一部分沉积物 。