Negative resist composition
    51.
    发明授权
    Negative resist composition 失效
    负阻抗组成

    公开(公告)号:US06936400B2

    公开(公告)日:2005-08-30

    申请号:US10603511

    申请日:2003-06-25

    摘要: A negative resist composition is provided which is less likely to swell in an alkali developing solution. An alkali-developable negative resist composition is disclosed comprising a compound (A) which generates an acid upon exposure to radiation, and a resin component (B) which becomes insoluble in alkali under the action of an acid, wherein the component (B) is a resin component containing: (b1) a unit which becomes insoluble in an alkali solution as a result of the formation of a lactone under the action of an acid generated from the component (A), and (b2) a unit having an alcoholic hydroxyl group.

    摘要翻译: 提供了在碱性显影溶液中不太可能溶胀的负性抗蚀剂组合物。 公开了一种碱显影性负性抗蚀剂组合物,其包含在暴露于辐射时产生酸的化合物(A)和在酸的作用下变得不溶于碱的树脂组分(B),其中组分(B)为 树脂成分含有:(b1)在由(A)成分产生的酸的作用下由于内酯形成而在碱溶液中不溶的单元,(b2)具有醇羟基的单元 组。