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公开(公告)号:US06936400B2
公开(公告)日:2005-08-30
申请号:US10603511
申请日:2003-06-25
IPC分类号: C08F8/16 , C08F220/28 , G03F7/038 , H01L21/027 , G03F7/004
CPC分类号: G03F7/0382 , Y10S430/106 , Y10S430/111
摘要: A negative resist composition is provided which is less likely to swell in an alkali developing solution. An alkali-developable negative resist composition is disclosed comprising a compound (A) which generates an acid upon exposure to radiation, and a resin component (B) which becomes insoluble in alkali under the action of an acid, wherein the component (B) is a resin component containing: (b1) a unit which becomes insoluble in an alkali solution as a result of the formation of a lactone under the action of an acid generated from the component (A), and (b2) a unit having an alcoholic hydroxyl group.
摘要翻译: 提供了在碱性显影溶液中不太可能溶胀的负性抗蚀剂组合物。 公开了一种碱显影性负性抗蚀剂组合物,其包含在暴露于辐射时产生酸的化合物(A)和在酸的作用下变得不溶于碱的树脂组分(B),其中组分(B)为 树脂成分含有:(b1)在由(A)成分产生的酸的作用下由于内酯形成而在碱溶液中不溶的单元,(b2)具有醇羟基的单元 组。