公开(公告)号：US20070074961A1

公开(公告)日：2007-04-05

申请号：US11309475

申请日：2006-08-11

申请人： MING-CHIEN CHIU

发明人： MING-CHIEN CHIU

IPC分类号： H01H3/00

CPC分类号： H01H3/12 ,  H01H3/20 ,  H01H2001/5888 ,  H01H2009/265

摘要： A multiple switch device for controlling and linking a plurality of switches (600) disposed on a circuit board (500) comprises an operation button (110), a shaft (120), and at least one fixing base (130). The operation button comprises a handle (112) and a rod (114) fixed to the handle. The shaft comprises a connecting plate (122) disposed at an end of the shaft, and a plurality of protruding plates (124) disposed on the shaft. The rod is engaged with the connecting plate to securely connect the shaft and the operation button. Each of the protruding plates aligns with a corresponding switch. The fixing base supports the shaft on a circuit board.

摘要翻译： 用于控制和连接设置在电路板（500）上的多个开关（600）的多重开关装置包括操作按钮（110），轴（120）和至少一个固定底座（130）。 操作按钮包括手柄（112）和固定到手柄的杆（114）。 所述轴包括设置在所述轴的端部的连接板（122）和设置在所述轴上的多个突出板（124）。 杆与连接板接合以牢固地连接轴和操作按钮。 每个突出的板与对应的开关对齐。 固定底座支撑电路板上的轴。

公开(公告)号：US20050007576A1

公开(公告)日：2005-01-13

申请号：US10709761

申请日：2004-05-26

申请人： Ming-Chien Chiu

发明人： Ming-Chien Chiu

IPC分类号： G03B27/62 ,  G03F7/20

CPC分类号： G03F1/66 ,  G03B27/62

摘要： The present invention relates to an apparatus of holder of photomask for holding the photomask, which is placed in the transfer box and to be exposed by projecting light during process of manufacturing semiconductor, and more particularly to one being able to prevent the photomask from friction with the protrusions therein in consequence of not creating any dust particle. The holder is made of material of PEEK or VESPEL, which is abrasion resisting and high hardness. On the side of the protrusion is shaped in inclination toward center with the top in long cambered surface as supporting ridge. And, at distal end of the supporting ridge, a pedestal is given to jointly integrate with the holder so that the photomask can be placed thereon. Thus, by means of the supporting ridge with the long cambered surface of the protrusion to uphold photo mask, the contacting area of friction is reduced. Moreover, the characteristics of the protrusion is abrasion resisting and high hardness prevent from friction with the Chromium (Cr) deposition on the bottom surface of the photomask therein in consequence of not creating any dust particle.

摘要翻译： 本发明涉及一种用于保持光掩模的保持器的装置，该光掩模被放置在转移盒中并通过在制造半导体的过程中通过投射来曝光，更具体地涉及一种能够防止光掩模与 其中的突起不会产生任何灰尘颗粒。 支架由PEEK或VESPEL材料制成，具有耐磨性和高硬度。 在突起的一侧成形为中心倾斜，顶部以长弧形表面为支撑脊。 并且，在支撑脊的远端处，设有基座以与保持器共同整合，使得光掩模可以放置在其上。 因此，通过具有突起的长弧形表面的支撑脊，以支撑光掩模，摩擦的接触面积减小。 此外，由于不产生任何粉尘颗粒，突起的特征是耐磨性，并且高硬度防止与其中的光掩模的底表面上的铬（Cr）沉积物摩擦。