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公开(公告)号:US20060137820A1
公开(公告)日:2006-06-29
申请号:US11313022
申请日:2005-12-20
申请人: Young Lee , Jun Choi , Saeng Jo , Young-Joo Hwang , Jong-Cheon Kim
发明人: Young Lee , Jun Choi , Saeng Jo , Young-Joo Hwang , Jong-Cheon Kim
IPC分类号: H01L21/306 , C23F1/00
CPC分类号: H01L21/67069 , H01J37/3244 , H01J37/32522 , H01J37/32724
摘要: A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.
摘要翻译: 一种等离子体处理装置,用于在保持真空状态的室中产生等离子体,并使用等离子体处理衬底。 等离子体处理装置包括用于使形成在喷淋头中的制冷剂循环的制冷剂通道,从而容易地控制淋浴头的温度并提高等离子体处理的再现性。
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公开(公告)号:US20060071384A1
公开(公告)日:2006-04-06
申请号:US11239398
申请日:2005-09-29
CPC分类号: B23Q11/0891 , H01L21/6719
摘要: Disclosed herein is a flat panel display (FPD) manufacturing apparatus for performing a desired process for a substrate positioned in a chamber after establishing a vacuum atmosphere in the chamber. The vacuum chamber is divided into a chamber body and an upper cover to ensure easy opening/closing operations of the upper cover.
摘要翻译: 这里公开了一种平板显示器(FPD)制造装置,用于在腔室中建立真空气氛之后,对位于腔室中的基板执行期望的处理。 真空室被分为室主体和上盖,以确保上盖容易的打开/关闭操作。
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