公开(公告)号：US20160312354A1

公开(公告)日：2016-10-27

申请号：US14974356

申请日：2015-12-18

Applicant: Samsung Display Co., Ltd.

Inventor： Junhyeuk KO ,  Sangshin LEE

IPC: C23C14/04 ,  H01L51/00 ,  H01L51/56

CPC classification number: C23C14/042 ,  H01L51/0011 ,  H01L51/0021 ,  H01L51/5012 ,  H01L51/5206 ,  H01L51/5221 ,  H01L51/56

Abstract: A mask frame assembly including a frame including a first opening, a first mask including second openings that each has an area smaller than the first opening and a first surface having portions of the first surface connected to the frame. The mask frame assembly includes second masks disposed on a second surface of the first mask extending across the first opening in a first direction and arranged in a second direction that is substantially perpendicular. The second masks include pattern parts having a shape corresponding to the second openings. The pattern parts each include pattern holes configured to allow a deposition material to pass through. The second masks include a rib part disposed between the pattern parts. The rib part includes dummy holes each having an area greater than each of the pattern holes. The first mask is configured to block the deposition material passing through the dummy holes.

Abstract translation: 一种面罩框架组件，包括包括第一开口的框架，包括第二开口的第一掩模和第一开口，所述第一开口具有小于所述第一开口的面积，以及第一表面，所述第一表面具有连接到所述框架的所述第一表面的部分。 掩模框架组件包括设置在第一掩模的第二表面上的第二掩模，该第二掩模在第一方向上延伸穿过第一开口并且沿基本垂直的第二方向布置。 第二掩模包括具有对应于第二开口的形状的图案部分。 图案部分各自包括被配置为允许沉积材料通过的图案孔。 第二掩模包括布置在图案部分之间的肋部。 肋部包括各自具有大于每个图案孔的面积的虚拟孔。 第一掩模被配置为阻挡通过虚拟孔的沉积材料。