公开(公告)号：US20160005774A1

公开(公告)日：2016-01-07

申请号：US14323533

申请日：2014-07-03

Applicant: OmniVision Technologies, Inc.

Inventor： Oray Orkun Cellek

IPC: H01L27/146 ,  H01L31/0203

CPC classification number: H01L27/14685 ,  H01L27/1462 ,  H01L27/14687

Abstract: A fractal-edge thin film includes a material layer having a perimeter with a fractal dimension exceeding one, the material layer having greater peel resistance as compared to a thin-film material layer with fractal dimension equaling one.A method of manufacturing a fractal-edge thin film includes determining an area shape to be covered by the fractal-edge thin film. The method also includes generating a thin-film perimeter based upon the area shape, the thin-film perimeter having a fractal dimension exceeding one. The method also includes determining a photomask perimeter such that a photomask with the photomask perimeter, when used in a photolithography process, yields a fractal-edge thin film with the thin-film perimeter. The method may also include photolithographically etching a thin-film, the thin film having a photoresist layer disposed thereon, the photoresist layer having been exposed through the photomask, wherein the etching results in the fractal-edge thin film.

Abstract translation: 分形边缘薄膜包括具有分形维数超过1的周长的材料层，与具有等分尺寸的分形维数的薄膜材料层相比，材料层具有较大的剥离阻力。 分形边缘薄膜的制造方法包括确定由分形边缘薄膜覆盖的面积形状。 该方法还包括基于面积形状产生薄膜周长，薄膜周长具有超过一分形维数。 该方法还包括确定光掩模周长，使得具有光掩模周边的光掩模在光刻工艺中使用时产生具有薄膜周边的分形边缘薄膜。 该方法还可以包括光刻蚀刻薄膜，该薄膜具有设置在其上的光致抗蚀剂层，光致抗蚀剂层已经通过光掩模曝光，其中蚀刻导致分形边缘薄膜。