公开(公告)号：US07667841B2

公开(公告)日：2010-02-23

申请号：US12288395

申请日：2008-10-20

Applicant: Jon Opsal

Inventor： Jon Opsal

IPC: G01N11/06

CPC classification number: G01B11/0641 ,  G01J4/04 ,  G01N21/211 ,  G01N2021/213

Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.

Abstract translation: 公开了一种用于从样品获得椭偏测量的装置。 探针光束聚焦在样品上以产生入射角的扩展。 光束通过四分之一波片延迟器和偏振器。 反射光束由检测器测量。 在一个优选实施例中，检测器包括八个径向布置的段，每个段产生代表多个入射角的积分的输出。 处理器处理来自各个段的输出以导出椭偏信息。

公开(公告)号：US07502104B2

公开(公告)日：2009-03-10

申请号：US11890712

申请日：2007-08-06

Applicant: Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

Inventor： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

IPC: G01N21/00

CPC classification number: G01N21/1717 ,  G01N21/4788 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2021/1731 ,  G01N2021/214

Abstract: The present invention provides a probe beam profile—modulated optical reflectivity metrology system having a modulated pump source for exciting the sample. A separate probe beam is directed to interact with the sample in a manner so that the rays within the probe beam create a spread of angles of incidence. A detector array simultaneously measures intensities of the rays within the reflected/diffracted probe beam simultaneously at different angles of incidence. The intensity and angle of incidence information is used to analyze the sample.

Abstract translation: 本发明提供一种具有用于激发样品的调制泵浦源的探测光束分布调制光学反射率测量系统。 引导单独的探针光束以与样品相互作用的方式使得探针束内的光线产生入射角的扩展。 检测器阵列同时以不同的入射角测量反射/衍射探测光束内的光线的强度。 使用入射信息的强度和角度分析样品。

公开(公告)号：US20080309943A1

公开(公告)日：2008-12-18

申请号：US12185297

申请日：2008-08-04

Applicant: Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

Inventor： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

IPC: G01N21/55

CPC classification number: G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

Abstract: A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

Abstract translation: 调制反射测量系统包括三个基于单色二极管的激光器。 每个激光器可以作为探测光束或作为泵浦光源操作。 使用一系列反射镜和分束器将激光输出重定向到达物镜。 物镜将激光输出聚焦在样品上。 反射能量通过目标返回，并被分束器重定向到检测器。 锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。 处理器使用Q和/或I信号来分析样本。 通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

公开(公告)号：US07400403B2

公开(公告)日：2008-07-15

申请号：US11715584

申请日：2007-03-08

Applicant: Jon Opsal

Inventor： Jon Opsal

IPC: G01J4/00

CPC classification number: G01J4/04 ,  G01N21/211

Abstract: An optical inspection device includes a light source for generating a probe beam. The probe beam is focused onto a sample to create a spread of angles of incidence. After reflecting from the sample, the light is imaged onto a two dimensional array of photodetectors. Prior to reaching the detector array, the beam is passed through a rotating compensator. A processor functions to evaluate the sample by analyzing the output of the photodetectors lying along one or more azimuthal angles and at different compensator positions.

Abstract translation: 光学检查装置包括用于产生探测光束的光源。 探测光束被聚焦到样品上以产生入射角的扩展。 从样品反射后，将光成像到二维阵列的光电探测器上。 在到达检测器阵列之前，光束通过旋转补偿器。 处理器用于通过分析沿着一个或多个方位角并且处于不同补偿器位置的光电探测器的输出来评估样本。

公开(公告)号：US20080074668A1

公开(公告)日：2008-03-27

申请号：US11899105

申请日：2007-09-04

Applicant: Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

Inventor： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

IPC: G01N21/63

CPC classification number: G01N21/636 ,  G01N21/1717

Abstract: A modulated optical reflectance (MOR) measurement system is disclosed which uses an infrared probe beam. Preferably the probe beam has a wavelength of at least 800 nm and preferable greater than one micron (1000 nm).

Abstract translation: 公开了使用红外探测光束的调制光反射（MOR）测量系统。 优选地，探针束的波长为至少800nm，优选大于1微米（1000nm）。

公开(公告)号：US20070188761A1

公开(公告)日：2007-08-16

申请号：US11656610

申请日：2007-01-23

Applicant: Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

Inventor： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

IPC: G01N21/00

CPC classification number: G01N21/1717 ,  G01N21/55 ,  G01N2021/1719

Abstract: A metrology tool for semiconductor wafers is disclosed which combines modulated reflectivity measurement with junction photovoltage measurements. The tool includes an intensity modulated pump beam for periodically exciting the sample. A separate probe beam is used to monitor changes in optical reflectivity of the sample. In addition, capacitive electrodes are provided to measure modulated changes in the voltage across the electrodes. These measurements are combined to evaluate the wafer. These measurement can be particularly useful in characterizing ultrashallow junctions.

Abstract translation: 公开了一种用于半导体晶片的计量工具，其将调制反射率测量与结光电压测量相结合。 该工具包括用于周期性激发样品的强度调制泵浦光束。 单独的探针光束用于监测样品光学反射率的变化。 此外，提供电容电极以测量电极两端的电压的调制变化。 将这些测量结合起来以评估晶片。 这些测量在表征超小结点方面特别有用。

公开(公告)号：US07233390B2

公开(公告)日：2007-06-19

申请号：US10795915

申请日：2004-03-08

Applicant: Yia-Chung Chang ,  Hanyou Chu ,  Jon Opsal

Inventor： Yia-Chung Chang ,  Hanyou Chu ,  Jon Opsal

IPC: G01N21/00

CPC classification number: G01N21/95607

Abstract: A method for simulating the optical properties of samples having non-uniform line edges includes creating a model for the sample being analyzed. To simulate roughness, lines within the model are represented as combinations of three dimensional objects, such as circular or elliptical mesas. The three-dimensional objects are arranged in a partially overlapping linear fashion. The objects, when spaced closely together resemble a line with edge roughness that corresponds to the object size and pitch. A second method allows lines within the model to vary in width over their lengths. The model is evaluated using a suitable three-dimensional technique to simulate the optical properties of the sample being analyzed.

Abstract translation: 用于模拟具有不均匀线边缘的样品的光学性质的方法包括为正在分析的样品创建模型。 为了模拟粗糙度，模型中的线被表示为三维对象的组合，例如圆形或椭圆形台面。 三维物体以部分重叠的线性方式排列。 当物体间隔紧密的时候，物体的边缘粗糙度对应于物体的大小和间距。 第二种方法允许模型内的线宽度在其长度上变化。 使用合适的三维技术评估该模型，以模拟正在分析的样品的光学性质。

公开(公告)号：US07215431B2

公开(公告)日：2007-05-08

申请号：US10794094

申请日：2004-03-04

Applicant: Jon Opsal

Inventor： Jon Opsal

IPC: G01B11/28 ,  G01B11/06

CPC classification number: G01N21/211 ,  G01B11/0641 ,  G01B2210/56

Abstract: Fluid immersion technology can be utilized to increase the resolution and angular range of existing metrology systems. An immersion fluid placed between the metrology optics and the sample can reduce the refraction at the sample interface, thereby decreasing the spot size of the beam on a feature of the sample while simultaneously increasing the angular range of the system. The decreased spot size, in combination with an increased angular spread, allows an existing metrology system to measure parameters of a sample, such as a semiconductor or microelectronic device, with improved resolution and without expensive and/or complex changes to the mechanics of the metrology system.

Abstract translation: 流体浸没技术可用于提高现有计量系统的分辨率和角度范围。 放置在计量光学元件和样品之间的浸没流体可以减少样品界面处的折射，从而在样品特征上减小光束的光斑尺寸，同时增加系统的角度范围。 减小的光斑尺寸与增加的角度扩展相结合，允许现有的计量系统以改进的分辨率测量样品（例如半导体或微电子器件）的参数，并且不会对计量学的力学进行昂贵和/或复杂的变化 系统。

公开(公告)号：US07206070B2

公开(公告)日：2007-04-17

申请号：US11269204

申请日：2005-11-08

Applicant: Jon Opsal

Inventor： Jon Opsal

IPC: G01N11/06

CPC classification number: G01J4/04 ,  G01N21/211

Abstract: An optical inspection device includes a light source for generating a probe beam. The probe beam is focused onto a sample to create a spread of angles of incidence. After reflecting from the sample, the light is imaged onto a two dimensional array of photodetectors. Prior to reaching the detector array, the beam is passed through a rotating compensator. A processor functions to evaluate the sample by analyzing the output of the photodetectors lying along one or more azimuthal angles and at different compensator positions.

Abstract translation: 光学检查装置包括用于产生探测光束的光源。 探测光束被聚焦到样品上以产生入射角的扩展。 从样品反射后，将光成像到二维阵列的光电探测器上。 在到达检测器阵列之前，光束通过旋转补偿器。 处理器用于通过分析沿着一个或多个方位角并且处于不同补偿器位置的光电探测器的输出来评估样本。

公开(公告)号：US20070040852A1

公开(公告)日：2007-02-22

申请号：US11542806

申请日：2006-10-04

Applicant: Jon Opsal ,  Hanyou Chu ,  Xuelong Cao ,  Youxian Wen

Inventor： Jon Opsal ,  Hanyou Chu ,  Xuelong Cao ,  Youxian Wen

IPC: G09G5/00

CPC classification number: G01N21/4788

Abstract: A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.

Abstract translation: 用于建模样本的方法包括使用控制点来定义线轮廓和其他几何形状。 模型中使用的每个控制点影响模型内的形状。 通常，控制点以连接点的方式使用，其中一组点定义形状的轮廓或轮廓。 样品中的层通常被模拟，独立于使用控制点定义的形状。 总体结果是最小化用于建模形状的参数数量，同时保持得到的散射测量模型的准确性。