公开(公告)号：US20140120474A1

公开(公告)日：2014-05-01

申请号：US14067186

申请日：2013-10-30

Applicant: BOE Technology Group Co., Ltd.

Inventor： Lu LIU ,  Jianshe XUE ,  Guanbao HUI

IPC: G03F7/039

CPC classification number: G03F7/0392 ,  C07C61/29 ,  C07C2603/90 ,  G03F7/0295 ,  G03F7/38

Abstract: The invention discloses a deep-ultraviolet chemically-amplified positive photoresist. The deep-ultraviolet chemically-amplified positive photoresist according to one embodiment of the invention includes a cyclopentenyl pimaric acid, a divinyl ether, a photoacid generator and an organic solvent. The deep-ultraviolet chemically-amplified positive photoresist according to the invention has a good sensitivity and a good transparency.

Abstract translation: 本发明公开了一种深紫外线化学放大的正性光致抗蚀剂。 根据本发明一个实施方案的深紫外线化学放大型正性光致抗蚀剂包括环戊烯基海松酸，二乙烯基醚，光酸产生剂和有机溶剂。 根据本发明的深紫外线化学放大型正性光致抗蚀剂具有良好的灵敏度和良好的透明度。