公开(公告)号：US11940736B2

公开(公告)日：2024-03-26

申请号：US17398054

申请日：2021-08-10

Applicant: Gigaphoton Inc.

Inventor： Gota Niimi ,  Yoshifumi Ueno ,  Shinji Nagai

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/006

Abstract: A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.

公开(公告)号：US10268118B2

公开(公告)日：2019-04-23

申请号：US15945214

申请日：2018-04-04

Applicant: Gigaphoton Inc.

Inventor： Yoshifumi Ueno

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06

Abstract: An extreme ultraviolet light generating apparatus includes a light collecting mirror that reflects and focuses extreme ultraviolet light, and a magnet that generates a magnetic field. The light collecting mirror includes a first mirror portion that includes a first reflective surface formed by a portion of a spheroidal surface, and a second mirror portion that includes a second reflective surface having a focal point at substantially the same position as a focal point of the first reflective surface, formed by a portion of a spheroidal surface different from that of the first reflective surface. The second reflective surface is provided at a position at which a magnetic flux density caused by the magnetic field is lower than that of the first reflective surface.

公开(公告)号：US09192037B2

公开(公告)日：2015-11-17

申请号：US13960108

申请日：2013-08-06

Applicant: GIGAPHOTON INC.

Inventor： Yoshifumi Ueno

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A control method for a target supply device includes melting a target material by heating the target material within a target generator using a heating unit, pushing out the target material from a nozzle hole in a nozzle by pressurizing the interior of the target generator using a pressure control unit, determining whether or not the size of an adhering area of the target material that forms when the target material is pushed out from the nozzle hole and adheres to a leading end of the nozzle has reached a set size that covers the entire nozzle hole, stopping the pressurization of the interior of the target generator by the pressure control unit when the size of the adhering area has reached the set size, and hardening the target material in the target generator and the adhering area by stopping the heating of the target material by the heating unit.

Abstract translation: 目标供给装置的控制方法包括使用加热单元对目标发生器内的目标材料进行加热来熔化目标材料，通过使用压力对目标发生器的内部进行加压，从喷嘴孔喷出目标材料 控制单元，确定当目标材料从喷嘴孔被推出并粘附到喷嘴的前端时形成的目标材料的粘合区域的尺寸是否已经达到覆盖整个喷嘴孔的设定尺寸 当粘合面积的尺寸达到设定尺寸时，通过压力控制单元停止对目标发生器内部的加压，并且通过停止对象材料的加热来硬化目标发生器中的目标材料和粘附区域 由加热单元。