Slurry for color photoresist planarization
    21.
    发明申请
    Slurry for color photoresist planarization 审中-公开
    用于彩色光致抗蚀剂平坦化的浆料

    公开(公告)号:US20050136669A1

    公开(公告)日:2005-06-23

    申请号:US10848019

    申请日:2004-05-18

    CPC分类号: C09G1/02

    摘要: The present invention relates to a chemical mechanical abrasive slurry for polishing a color photoresist, comprising composite abrasive particles and an aqueous medium. The abrasive slurry of the present invention can effectively polish off horn-like protuberances color filter processing.

    摘要翻译: 本发明涉及一种用于抛光彩色光致抗蚀剂的化学机械磨料浆料,其包含复合磨料颗粒和水性介质。 本发明的磨料浆料可以有效地抛光喇叭形突起物滤色器处理。