公开(公告)号：US10578927B2

公开(公告)日：2020-03-03

申请号：US15743025

申请日：2017-07-12

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Bongkwan Jung ,  Weijie Wang ,  Qinghui Zeng

IPC: G02F1/1339 ,  G03F7/30 ,  G03F7/40 ,  G03F7/38

Abstract: A method for manufacturing spacers and a method for manufacturing a display substrate are disclosed. The method for manufacturing spacers includes performing an over-development process on the photoresist layer processed by the exposure process to form a first photoresist pattern and a second photoresist pattern on the substrate; an outer edge of a lower portion of the first photoresist pattern near the substrate is provided with a recess, and an outer edge of a lower portion of the second photoresist pattern near the substrate is provided with a recess; waiting a first duration for photoresist on a surface of the first photoresist pattern to flow downwards to fill the recess of the first photoresist pattern, and photoresist on a surface of the second photoresist pattern to flow downwards to fill the recess of the second photoresist pattern.

公开(公告)号：US20140055760A1

公开(公告)日：2014-02-27

申请号：US13973057

申请日：2013-08-22

Applicant: BOE Technology Group Co., Ltd.

Inventor： Can Wang ,  Weijie Wang ,  Xuan He

IPC: G03F7/32

CPC classification number: G03G15/105 ,  G03F7/30 ,  G03F7/32

Abstract: A developing apparatus comprises: a photodetection unit, which emits detecting light toward the development area of the substrate to be developed within a scheduled time after the substrate to be developed is immersed into the developer solution; and a processing unit electrically coupled with the photodetection unit for determining the time interval which it takes for development to occur in the development area by means of the detecting light, and for determining that the developer solution is failed if the development time interval is determined to be out of the preset time range. A method for monitoring the developer solution is also provided.

Abstract translation: 显影装置包括：光电检测单元，其在待显影基板被浸入显影剂溶液中之后的预定时间内向待显影基板的显影区域发射检测光; 以及处理单元，与所述光电检测单元电耦合，用于通过所述检测光来确定用于显影区域发展的时间间隔，并且如果显影时间间隔被确定为 超出预设时间范围。 还提供了用于监测显影剂溶液的方法。