公开(公告)号：US20140273419A1

公开(公告)日：2014-09-18

申请号：US14292300

申请日：2014-05-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Joseph M. RANISH ,  Paul BRILLHART ,  Jose Antonio MARIN ,  Satheesh KUPPURAO ,  Balasubramanian RAMACHANDRAN ,  Swaminathan T. SRINIVASAN ,  Mehmet Tugrul SAMIR

IPC: H01L21/67 ,  H01L21/02

CPC classification number: C30B25/105 ,  C23C16/4583 ,  C23C16/481 ,  C23C16/52 ,  C30B25/08 ,  C30B25/12 ,  C30B25/14 ,  C30B25/16 ,  G01J5/0007 ,  G01J5/10 ,  G01J2005/106 ,  H01L21/0262 ,  H01L21/67115 ,  H01L21/67248 ,  H01L22/10 ,  H01L22/20

Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a vacuum chamber having a dome and a floor. A substrate support is disposed inside the vacuum chamber. A plurality of thermal lamps are arranged in a lamphead and positioned proximate the floor of the vacuum chamber. A reflector is disposed proximate the dome, where the reflector and the dome together define a thermal control space. The substrate processing apparatus further includes a plurality of power supplies coupled to the thermal lamps and a controller for adjusting the power supplies to control a temperature in the vacuum chamber.

Abstract translation: 提供了一种基板处理装置。 基板处理装置包括具有圆顶和底板的真空室。 衬底支撑件设置在真空室内。 多个热灯布置在灯头中并且靠近真空室的地板定位。 反射器靠近穹顶设置，其中反射器和穹顶一起限定了热控制空间。 基板处理装置还包括耦合到热灯的多个电源和用于调节电源以控制真空室中的温度的控制器。