公开(公告)号：US20130148200A1

公开(公告)日：2013-06-13

申请号：US13763709

申请日：2013-02-10

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Dirk Heinrich Ehm ,  Stephan Muellender ,  Thomas Stein ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Dieter Kraus ,  Richard Versluis ,  Marcus Gerhardus Hendrikus Meijerink

IPC: G03B27/16

CPC classification number: G03B27/16 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70883 ,  G03F7/70916 ,  G21K2201/061

Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

Abstract translation: 光学装置，例如 用于EUV光刻的投影曝光装置（1）包括：封闭内部空间（15）的壳体（2）; 布置在壳体（2）中的至少一个优选反射光学元件（4-10,12,14.1-14.6）; 至少一个用于所述壳体（2）的内部空间（15）的真空发生单元（3）; 以及布置在所述内部空间（15）中并且至少包围所述光学元件（4-10,12,14.1-14.5）的光学表面（17,17.1,17.2）的至少一个真空壳体（18,18.1-18.10） 。 污染减少单元与真空壳体（18.1-18.10）相关联，并且至少紧邻光学表面（17,17.1,17.2）处的污染物质特别是水和/或烃的分压降低 与内部空间（15）中污染物质的分压有关。

公开(公告)号：US11846887B2

公开(公告)日：2023-12-19

申请号：US17715641

申请日：2022-04-07

Applicant: ASML Netherlands B.V.

Inventor： Yue Ma ,  Antonius Theodorus Wilhelmus Kempen ,  Klaus Martin Hummler ,  Johannes Hubertus Josephina Moors ,  Jeroen Hubert Rommers ,  Hubertus Johannes Van De Wiel ,  Andrew David Laforge ,  Fernando Brizuela ,  Rob Carlo Wieggers ,  Umesh Prasad Gomes ,  Elena Nedanovska ,  Celal Korkmaz ,  Alexander Downn Kim ,  Rui Miguel Duarte Rodrigues Nunes ,  Hendrikus Alphonsus Ludovicus Van Dijck ,  William Peter Van Drent ,  Peter Gerardus Jonkers ,  Qiushi Zhu ,  Parham Yaghoobi ,  Jan Steven Christiaan Westerlaken ,  Martinus Hendrikus Antonius Leenders ,  Alexander Igorevich Ershov ,  Igor Vladimirovich Fomenkov ,  Fei Liu ,  Johannes Henricus Wilhelmus Jacobs ,  Alexey Sergeevich Kuznetsov

IPC: G03F7/00

CPC classification number: G03F7/70166 ,  G03F7/70033 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70925

Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.