公开(公告)号：US20210096472A1

公开(公告)日：2021-04-01

申请号：US16978445

申请日：2019-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Valerio ALTINI ,  Frank STAALS

IPC: G03F7/20

Abstract: A method for controlling a scanning exposure apparatus configured for scanning an illumination profile over a substrate to form functional areas thereon. The method includes determining a control profile for dynamic control of the illumination profile during exposure of an exposure field including the functional areas, in a scanning exposure operation; and optimizing a quality of exposure of one or more individual functional areas. The optimizing may include a) extending the control profile beyond the extent of the exposure field in the scanning direction; and/or b) applying a deconvolution scheme to the control profile, wherein the structure of the deconvolution scheme is based on a dimension of the illumination profile in the scanning direction.

公开(公告)号：US20200348603A1

公开(公告)日：2020-11-05

申请号：US16762616

申请日：2018-11-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Frank STAALS

IPC: G03F7/20

Abstract: A method for controlling a lithographic apparatus, and associated apparatuses. The method is configured to provide product structures to a substrate in a lithographic process and includes determining optimization data. The optimization data includes measured and/or simulated data of at least one performance parameter associated with the product structures and/or their arrangement which are to be applied to the substrate in the lithographic process. Substrate specific metrology data as measured and/or modeled before the providing of product structures to the substrate is determined, the substrate specific metrology data including metrology data relating to a characteristic of the substrate to which the structures are being applied and/or the state of the lithographic apparatus at the time that the structures are applied to the substrate. The method further includes optimizing control of the lithographic apparatus during the lithographic process based on the optimization data and the substrate specific metrology data.

公开(公告)号：US20190317412A1

公开(公告)日：2019-10-17

申请号：US16343168

申请日：2017-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Everhardus Cornelis MOS ,  Jochem Sebastiaan WILDENBERG ,  Erik Johannes Maria WALLERBOS ,  Maurits VAN DER SCHAAR ,  Frank STAALS ,  Franciscus Hendricus Arnoldus ELICH

IPC: G03F7/20

Abstract: A method for improving the yield of a lithographic process, the method including: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated with an allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.

公开(公告)号：US20190056673A1

公开(公告)日：2019-02-21

申请号：US16045979

申请日：2018-07-26

Applicant: ASML Netherlands B.V.

Inventor： Fahong LI ,  Miguel GARCIA GRANDA ,  Carlo Cornells Marla LUIJTEN ,  Bart Peter Bert SEGERS ,  Cornelis Andreas Franciscus Johannes VAN DER POEL ,  Frank STAALS ,  Anton Bernhard VAN OOSTEN ,  Mohamed RiDANE

IPC: G03F7/20

Abstract: Focus performance of a lithographic apparatus is measured using pairs of targets that have been exposed (1110) with an aberration setting (e.g. astigmatism) that induces a relative best focus offset between them. A calibration curve (904) is obtained in advance by exposing similar targets on FEM wafers (1174, 1172). In a set-up phase, calibration curves are obtained using multiple aberration settings, and an anchor point (910) is recorded, where all the calibration curves intersect. When a new calibration curve is measured (1192), the anchor point is used to produce an adjusted updated calibration curve (1004′) to cancel focus drift and optionally to measure drift of astigmatism. Another aspect of the disclosure (FIG. 13-15) uses two aberration settings (+AST, −AST) in each measurement, reducing sensitivity to astigmatism drift. Another aspect (FIG. 16-17) uses pairs of targets printed with relative focus offsets, by double exposure in one resist layer.

公开(公告)号：US20160109812A1

公开(公告)日：2016-04-21

申请号：US14965467

申请日：2015-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Joost Jeroen OTTENS ,  Emiel Jozef Melanie EUSSEN ,  Johannes Henricus Wilhelmus JACOBS ,  William Peter VAN DRENT ,  Frank STAALS ,  Lukasz Jerzy MACHT ,  Erik Willem BOGAART

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

Abstract translation: 一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。 衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。

公开(公告)号：US20240004299A1

公开(公告)日：2024-01-04

申请号：US18233263

申请日：2023-08-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo TEL ,  Mark John MASLOW ,  Frank STAALS ,  Paul Christiaan HINNEN

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/2043 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/705 ,  G03F7/70616 ,  H01L22/20

Abstract: A method involving determining a contribution that one or more process apparatuses make to a characteristic of a substrate after the substrate has been processed according to a patterning process by the one or more process apparatuses by removing from values of the characteristic of the substrate a contribution of a lithography apparatus to the characteristic and a contribution of one or more pre-lithography process apparatuses to the characteristic.

公开(公告)号：US20220091517A1

公开(公告)日：2022-03-24

申请号：US17420388

申请日：2019-12-05

Applicant: ASML Netherlands B.V.

Inventor： Frank STAALS ,  Christoph Rene Konrad Cebull HENNERKES

IPC: G03F7/20

Abstract: Disclosed is a method for selecting a structure for focus monitoring. The method comprises: simulating a Bossung response with focus of a focus dependent parameter, for one or more different structures; and selecting a structure for focus monitoring in a manufacturing process based on the results of said simulating step. The simulating step may be performed using a computational lithography simulation.

公开(公告)号：US20200004164A1

公开(公告)日：2020-01-02

申请号：US16480706

申请日：2018-01-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Emil Peter SCHMITT-WEAVER ,  Kaustuve BHATTACHARYYA ,  Wim Tjibbo TEL ,  Frank STAALS ,  Leon Martin LEVASIER

IPC: G03F7/20 ,  G03F9/00

Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.

公开(公告)号：US20190324371A1

公开(公告)日：2019-10-24

申请号：US16308835

申请日：2017-06-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Léon Maria Albertus VAN DER LOGT ,  Bart Peter Bert SEGERS ,  Simon Hendrik Celine VAN GORP ,  Carlo Cornelis Maria LUIJTEN ,  Frank STAALS

IPC: G03F7/20

Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus should be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, the reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.

公开(公告)号：US20190271919A1

公开(公告)日：2019-09-05

申请号：US16461044

申请日：2018-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Davit HARUTYUNYAN ,  Fei JIA ,  Frank STAALS ,  Fuming WANG ,  Hugo Thomas LOOIJESTIJN ,  Cornelis Johannes RIJNIERSE ,  Maxim PISARENCO ,  Roy WERKMAN ,  Thomas THEEUWES ,  Tom VAN HEMERT ,  Vahid BASTANI ,  Jochem Sebastian WILDENBERG ,  Everhardus Cornelis MOS ,  Erik Johannes Maria WALLERBOS

IPC: G03F7/20

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method including: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.