公开(公告)号：US20060082746A1

公开(公告)日：2006-04-20

申请号：US10966108

申请日：2004-10-18

申请人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Antonius Van Der Net ,  Franciscus Johannes Teunissen ,  Patricius Aloysius Tinnemans ,  Martinus Cornelis Verhagen ,  Jacobus Johannus Leonardus Verspay ,  Edwin Van Gompel

发明人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Antonius Van Der Net ,  Franciscus Johannes Teunissen ,  Patricius Aloysius Tinnemans ,  Martinus Cornelis Verhagen ,  Jacobus Johannus Leonardus Verspay ,  Edwin Van Gompel

IPC分类号： G03B27/42

CPC分类号： G03F7/70716 ,  G03F7/70341

摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

公开(公告)号：US20060007419A1

公开(公告)日：2006-01-12

申请号：US10885489

申请日：2004-07-07

申请人： Bob Streefkerk ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens

发明人： Bob Streefkerk ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

公开(公告)号：US20060250590A1

公开(公告)日：2006-11-09

申请号：US11120176

申请日：2005-05-03

申请人： Bob Streefkerk ,  Sjoerd Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Martinus Leenders ,  Jeroen Johannes Mertens ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Martinus Leenders ,  Jeroen Johannes Mertens ,  Michel Riepen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US20050286032A1

公开(公告)日：2005-12-29

申请号：US10873650

申请日：2004-06-23

申请人： Joeri Lof ,  Johannes Catharinus Mulkens ,  Jeroen Johannes Mertens ,  Antonius Van Der Net ,  Ronald Van Der Ham ,  Nicolas Lallemant ,  Marcel Beckers

发明人： Joeri Lof ,  Johannes Catharinus Mulkens ,  Jeroen Johannes Mertens ,  Antonius Van Der Net ,  Ronald Van Der Ham ,  Nicolas Lallemant ,  Marcel Beckers

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70341 ,  G03F7/70808

摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.

摘要翻译： 公开了一种光刻投影装置。 该装置包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置用于使辐射束在其横截面上具有图案。 该设备还包括被配置为保持基板的基板台，配置成将图案化的光束投影到基板的目标部分上的投影系统以及被配置成向流体提供流体的流体供应系统。 体积包括投影系统的至少一部分和/或照明系统的至少一部分。 该装置还包括配置成将流体供应系统耦合到衬底台，衬底，支撑结构，图案形成装置或其任何组合的耦合装置。

公开(公告)号：US20050219499A1

公开(公告)日：2005-10-06

申请号：US10814815

申请日：2004-04-01

申请人： Koen Jacobus Maria Zaal ,  Jeroen Johannes Mertens ,  Joost Ottens

发明人： Koen Jacobus Maria Zaal ,  Jeroen Johannes Mertens ,  Joost Ottens

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/70691

摘要： A burl plate for use in immersion lithography has a higher burl density in a peripheral portion than in a medial portion so that when a higher pressure differential is applied in the peripheral portion the compression of the burls in the peripheral portion is substantially the same as in the medial portion.

摘要翻译： 用于浸没式光刻的凸缘板在周边部分中具有比在中间部分更高的凸起密度，使得当在周边部分中施加较高的压差时，周边部分中的毛边的压缩基本上与 内侧部分。