公开(公告)号：US20130119232A1

公开(公告)日：2013-05-16

申请号：US13662264

申请日：2012-10-26

Applicant: Gigaphoton Inc.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: G01J1/26 ,  G21K5/00

CPC classification number: G01J1/4257 ,  G01J1/0429 ,  G01J1/429 ,  G01J1/44 ,  G01J9/00 ,  G03F7/70258 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.