公开(公告)号：US20160026090A1

公开(公告)日：2016-01-28

申请号：US14878034

申请日：2015-10-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Chawon KOH ,  Su Min KIM ,  Hyunwoo KIM ,  Hyojin YUN

IPC: G03F7/40 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

CPC classification number: G03F7/40 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/426 ,  H01L21/0206

Abstract: A photolithographic rinse solution includes deionized water, and a surfactant, the surfactant including a cyclic amine group and at least one non-amine cyclic group joined to or fused with the cyclic amine group, wherein the cyclic amine group includes a ring having a carbon number of 4 to 6, and the non-amine cyclic group includes a ring having a carbon number of 5 to 8.

Abstract translation: 光刻冲洗液包括去离子水和表面活性剂，所述表面活性剂包括环胺基团和至少一个与环胺基团连接或稠合的非胺环状基团，其中所述环胺基团包括具有碳数的环 为4〜6，非胺环基包括碳数为5〜8的环。