公开(公告)号：US20160085150A1

公开(公告)日：2016-03-24

申请号：US14627690

申请日：2015-02-20

Applicant: Samsung Display Co. Ltd.

Inventor： Jeong Won KIM ,  Kwang Woo PARK ,  Seung Bo SHIM ,  Jun Hyuk WOO ,  Jin Ho JU

IPC: G03F7/038 ,  H05K3/06

CPC classification number: H05K3/06 ,  G03F7/0048 ,  G03F7/022 ,  G03F7/0233 ,  G03F7/0236 ,  G03F7/0757 ,  H05K3/064

Abstract: A photoresist composition includes an alkali soluble resin, a photosensitive compound, a first solvent having a boiling point of less than 200° C., and a second solvent having a boiling point of equal to or greater than 200° C.

Abstract translation: 光致抗蚀剂组合物包括碱溶性树脂，光敏化合物，沸点低于200℃的第一溶剂和沸点等于或大于200℃的第二溶剂。