公开(公告)号：US20210392733A1

公开(公告)日：2021-12-16

申请号：US17284060

申请日：2019-10-25

Applicant: ASML Netherlands B.V.

Inventor： Bob Rollinger ,  Georgiy Olegovich Vaschenko ,  Chirag Rajyaguru ,  Alexander Igorevich Ershov ,  Joshua Mark Lukens ,  Mathew Cheeran Abraham

IPC: H05G2/00

Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.

公开(公告)号：US20200344867A1

公开(公告)日：2020-10-29

申请号：US16960947

申请日：2019-01-03

Applicant: ASML Netherlands B.V.

Inventor： Joshua Mark Lukens ,  Bob Rollinger ,  Pooriya Beyhaghi

IPC: H05G2/00

Abstract: Provided is an apparatus for and method of controlling formation of droplets (102a, b) used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source (92) includes a fluid exiting an nozzle (98) and a sub-system having an electro-actuatable element (104) producing a disturbance in the fluid (96). The droplet source produces a stream (100) that breaks down into droplets that in turn coalesce into larger droplets as they progress towards the irradiation region. The electro-actuatable element is driven by a hybrid waveform that controls the droplet generation/coalescence process. Also disclosed is a method of determining the transfer function for the nozzle.