公开(公告)号：US12287455B2

公开(公告)日：2025-04-29

申请号：US17625426

申请日：2020-06-26

Applicant: ASML Netherlands B.V.

Inventor： Yue Ma ,  Marcus Adrianus Van De Kerkhof ,  Qiushi Zhu ,  Klaus Martin Hummler ,  Peter Matthew Mayer ,  Kay Hoffmann ,  Andrew David LaForge ,  Igor Vladimirovich Fomenkov ,  Daniel John William Brown

IPC: G02B5/08 ,  G02B1/14 ,  G03F7/00

Abstract: Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other species from penetrating the capping layer and underlying layers. The capping layer provides a low hydrogen recombination rate enabling hydrogen to clean the surface of the optical element. The capping layer may include an alloyed metal, a mixed metal oxide or a doped metal oxide and it may be a ruthenium capping layer that includes one or more dopants therein.

公开(公告)号：US20250085643A1

公开(公告)日：2025-03-13

申请号：US18962837

申请日：2024-11-27

Applicant: ASML Netherlands B.V.

Inventor： Chunguang Xia ,  Jonghoon Baek ,  John Tom Stewart, IV ,  Andrew David LaForge ,  Deniz Van Heijnsbergen ,  David Robert Evans ,  Nina Vladimirovna Dziomkina ,  Yue Ma

IPC: G03F7/00 ,  H01J37/32 ,  H05H1/46

Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

公开(公告)号：US20220260756A1

公开(公告)日：2022-08-18

申请号：US17625426

申请日：2020-06-26

Applicant: ASML Netherlands B.V.

Inventor： Yue Ma ,  Marcus Adrianus Van De Kerkhof ,  Qiushi Zhu ,  Klaus Martin Hummler ,  Peter Matthew Mayer ,  Kay Hoffmann ,  Andrew David LaForge ,  Igor Vladimirovich Fomenkov ,  Daniel John William Brown

IPC: G02B1/14 ,  G02B5/08 ,  G03F7/20

Abstract: Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other species from penetrating the capping layer and underlying layers. The capping layer provides a low hydrogen recombination rate enabling hydrogen to clean the surface of the optical element. The capping layer may include an alloyed metal, a mixed metal oxide or a doped metal oxide and it may be a ruthenium capping layer that includes one or more dopants therein.

公开(公告)号：US20190274210A1

公开(公告)日：2019-09-05

申请号：US16418652

申请日：2019-05-21

Applicant: ASML Netherlands B.V.

Inventor： Robert Jay Rafac ,  John Tom Stewart ,  Andrew David LaForge

IPC: H05G2/00

Abstract: A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target; a second target is provided to the interior of the vacuum chamber; and a second light beam is directed toward the second target to form a second plasma from target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the first and second emission directions being different.

公开(公告)号：US20180343730A1

公开(公告)日：2018-11-29

申请号：US16057101

申请日：2018-08-07

Applicant: ASML Netherlands B.V.

Inventor： Robert Jay Rafac ,  John Tom Stewart ,  Andrew David LaForge

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/005 ,  H05G2/006

Abstract: A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target; a second target is provided to the interior of the vacuum chamber; and a second light beam is directed toward the second target to form a second plasma from target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the first and second emission directions being different.