公开(公告)号：US10969701B2

公开(公告)日：2021-04-06

申请号：US16572156

申请日：2019-09-16

Applicant: ASML Netherlands B.V.

Inventor： Frits Van Der Meulen ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Jeroen Dekkers ,  Paul Janssen ,  Ronald Harm Gunther Kramer ,  Matthias Kruizinga ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Gerrit Van Den Bosch ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  Angelo Cesar Peter De Klerk ,  Jacobus Maria Dings ,  Maurice Leonardus Johannes Janssen ,  Roland Jacobus Johannes Kerstens ,  Martinus Jozef Maria Kester ,  Michel Loos ,  Geert Middel ,  Silvester Matheus Reijnders ,  Frank Johannes Christiaan Theuerzeit ,  Anne Johannes Wilhelmus Van Lievenoogen

IPC: G03F7/20 ,  G03F1/64

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US10571800B2

公开(公告)日：2020-02-25

申请号：US15545390

申请日：2016-02-01

Applicant: ASML Netherlands B.V.

Inventor： Derk Servatius Gertruda Brouns ,  Dennis De Graaf ,  Robertus Cornelis Martinus De Kruif ,  Paul Janssen ,  Matthias Kruizinga ,  Arnoud Willem Notenboom ,  Daniel Andrew Smith ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  James Norman Wiley

IPC: G03F1/84 ,  G03F1/66 ,  G03F1/22 ,  G03F1/42 ,  G03F1/64 ,  G03F1/62

Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.