公开(公告)号：US08817260B2

公开(公告)日：2014-08-26

申请号：US12616710

申请日：2009-11-11

Applicant: Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

Inventor： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC: G01N21/55 ,  G01N21/63

CPC classification number: G01N21/636 ,  G01N21/1717

Abstract: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

Abstract translation: 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US08049903B2

公开(公告)日：2011-11-01

申请号：US13073850

申请日：2011-03-28

Applicant: Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

Inventor： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

IPC: G01B11/14 ,  G01N21/00

CPC classification number: G01B11/0641

Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

Abstract translation: 公开了一种光学测量方法，用于评估具有重复特征的半导体区域内的特性的均匀性，例如存储管芯。 该方法包括用具有微米数量级的光斑尺寸的探针激光束获得测量值。 将这些测量与从校准测量获得的校准信息进行比较。 校准信息是通过用探头激光束测量校准样品和至少一种具有添加信息内容的其他技术得出的。 在优选实施例中，其它技术包括光谱反射测量或光谱椭偏仪中的至少一种。

公开(公告)号：US20100315625A1

公开(公告)日：2010-12-16

申请号：US12767339

申请日：2010-04-26

Applicant: Alex SALNIK ,  Jon Opsal ,  Lena Nicolaides

Inventor： Alex SALNIK ,  Jon Opsal ,  Lena Nicolaides

IPC: G01N21/00

CPC classification number: G01N21/1717 ,  G01N2021/1719 ,  G01N2021/178

Abstract: Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile.

Abstract translation: 使用调制光学反射率（MOR）测量公开了获得掺杂剂和损伤深度分布信息的方法。 在一个方面，使用从诸如结深度，结突起和掺杂剂浓度的各种测量获得的信息来构建深度分布。 另一方面，开发了一个完整的理论模型。 实际测量被馈送到模型。 使用迭代方法，将实际测量与从模型计算的理论测量值进行比较，以确定实际深度分布。

公开(公告)号：US07613598B2

公开(公告)日：2009-11-03

申请号：US11542806

申请日：2006-10-04

Applicant: Jon Opsal ,  Hanyou Chu ,  Xuelong Cao ,  Youxian Wen

Inventor： Jon Opsal ,  Hanyou Chu ,  Xuelong Cao ,  Youxian Wen

IPC: G06F17/50

CPC classification number: G01N21/4788

Abstract: A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.

Abstract translation: 用于建模样本的方法包括使用控制点来定义线轮廓和其他几何形状。 模型中使用的每个控制点影响模型内的形状。 通常，控制点以连接点的方式使用，其中一组点定义形状的轮廓或轮廓。 样品中的层通常被模拟，独立于使用控制点定义的形状。 总体结果是最小化用于建模形状的参数数量，同时保持得到的散射测量模型的准确性。

公开(公告)号：US20090259605A1

公开(公告)日：2009-10-15

申请号：US12486830

申请日：2009-06-18

Applicant: Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

Inventor： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

IPC: G06N3/02

CPC classification number: G01B11/0641

Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

Abstract translation: 公开了一种光学测量方法，用于评估具有重复特征的半导体区域内的特性的均匀性，例如存储管芯。 该方法包括用具有微米数量级的光斑尺寸的探针激光束获得测量值。 将这些测量与从校准测量获得的校准信息进行比较。 校准信息是通过用探头激光束测量校准样品和至少一种具有添加信息内容的其他技术得出的。 在优选实施例中，其它技术包括光谱反射测量或光谱椭偏仪中的至少一种。

公开(公告)号：US07456964B2

公开(公告)日：2008-11-25

申请号：US11715668

申请日：2007-03-08

Applicant: Jon Opsal

Inventor： Jon Opsal

IPC: G01B11/06

CPC classification number: G01B11/0641 ,  G01J4/04 ,  G01N21/211 ,  G01N2021/213

Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.

公开(公告)号：US07403022B2

公开(公告)日：2008-07-22

申请号：US11334962

申请日：2006-01-19

Applicant: Alex Salnik ,  Lena Nicolaides ,  Jon Opsal ,  Mira Bakshi

Inventor： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal ,  Mira Bakshi

IPC: G01R31/02

CPC classification number: G01N21/1717 ,  G01N2021/1725 ,  G01R31/2648 ,  G01R31/2656

Abstract: A method is disclosed for determining peak carrier concentration in ultra shallow junctions of semiconductor samples. A region of the surface of the sample is periodically excited. The effects of the excitation are monitored by a probe beam. Synchronous detection produces in-phase (I) and quadrature (Q) signals. These signals are compared to signals obtained from calibration samples to evaluate peak carrier concentration.

Abstract translation: 公开了一种用于确定半导体样品的超浅结中峰值载流子浓度的方法。 样品表面的周期性地被激发。 激发的影响由探测光束监测。 同步检测产生同相（I）和正交（Q）信号。 将这些信号与从校准样品获得的信号进行比较，以评估峰值载流子浓度。

公开(公告)号：US20080024780A1

公开(公告)日：2008-01-31

申请号：US11732125

申请日：2007-04-02

Applicant: Jon Opsal

Inventor： Jon Opsal

IPC: G01J3/30 ,  G01J4/00 ,  G01N21/25 ,  G01N21/47

CPC classification number: G01N21/211 ,  G01B11/0641 ,  G01B2210/56

Abstract: Fluid immersion technology can be utilized to increase the resolution and angular range of existing metrology systems. An immersion fluid placed between the metrology optics and the sample can reduce the refraction at the sample interface, thereby decreasing the spot size of the beam on a feature of the sample while simultaneously increasing the angular range of the system. The decreased spot size, in combination with an increased angular spread, allows an existing metrology system to measure parameters of a sample, such as a semiconductor or microelectronic device, with improved resolution and without expensive and/or complex changes to the mechanics of the metrology system.

Abstract translation: 流体浸没技术可用于提高现有计量系统的分辨率和角度范围。 放置在计量光学元件和样品之间的浸没流体可以减少样品界面处的折射，从而在样品特征上减小光束的光斑尺寸，同时增加系统的角度范围。 减小的光斑尺寸与增加的角度扩展相结合，允许现有的计量系统以改进的分辨率测量样品（例如半导体或微电子器件）的参数，并且不会对计量学的力学进行昂贵和/或复杂的变化 系统。

公开(公告)号：US20070219737A1

公开(公告)日：2007-09-20

申请号：US11715635

申请日：2007-03-08

Applicant: Jon Opsal ,  Jingmin Leng

Inventor： Jon Opsal ,  Jingmin Leng

IPC: G06F19/00

CPC classification number: G01B11/24

Abstract: A modeling approach is disclosed which addresses samples with different regions where the structures exhibit different periodicities. In this approach, a first partial model is generated which defines the shape, material properties and periodicity of the first region. In addition, a second partial model is generated defining the shape, material properties and periodicity of the second region. These two partial models are then merged into a combined model. When optimizing the combined model, the shape and material properties of the first and second models are independently adjusted. The optical responses of the model with differing shapes and material properties are-calculated and compared to a physical sample. This process is iteratively carried out to derive a final combined model that corresponds to a physical sample.

Abstract translation: 公开了一种建模方法，其解决具有不同区域的样品，其中结构呈现不同的周期性。 在该方法中，生成第一部分模型，其定义第一区域的形状，材料特性和周期性。 另外，产生限定第二区域的形状，材料特性和周期性的第二部分模型。 然后将这两个部分模型合并成一个组合模型。 在优化组合模型时，可以独立调整第一和第二模型的形状和材料特性。 具有不同形状和材料性质的模型的光学响应被计算并与物理样品进行比较。 迭代地执行该过程以得到对应于物理样本的最终组合模型。

公开(公告)号：US20070201017A1

公开(公告)日：2007-08-30

申请号：US11657359

申请日：2007-01-24

Applicant: Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

Inventor： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

IPC: G01N21/88 ,  G01J4/00 ,  G01N21/55

CPC classification number: G01B11/0641

Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

Abstract translation: 公开了一种光学测量方法，用于评估具有重复特征的半导体区域内的特性的均匀性，例如存储管芯。 该方法包括用具有微米数量级的光斑尺寸的探针激光束获得测量值。 将这些测量与从校准测量获得的校准信息进行比较。 通过使用探针激光束测量校准样品和至少一种具有添加信息内容的其他技术来得到校准信息。 在优选实施例中，其它技术包括光谱反射测量或光谱椭偏仪中的至少一种。