公开(公告)号：US20020081523A1

公开(公告)日：2002-06-27

申请号：US10003441

申请日：2001-12-06

申请人： Sumitomo Chemical Co., Ltd.

发明人： Yasunori Uetani ,  Hiroki Inoue

IPC分类号： G03F007/004

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/122

摘要： A positive resist composition is provided which comprises a resin having 2-alkyl-2-adamantyl (meth)acrylate polymerization unit represented by the following formula (I): 1 wherein R1 represents hydrogen or methyl and R2 represents an alkyl, and being insoluble or barely soluble in alkali, but being converted to soluble in alkali by the action of an and an acid generator represented by the following formula (V): 2 wherein Q1, Q2 and Q3 independently represent hydrogen, a hydroxyl group, an alkyl having 1 to 6 carbon atoms or an alkoxy having 1 to 6 carbon atoms, and n is an integer of 4 to 8; and gives a good resolution upon exposure by ArP excimer laser and has little substrate dependency.

摘要翻译： 提供一种正型抗蚀剂组合物，其包含具有由下式（I）表示的（甲基）丙烯酸2-烷基-2-金刚烷基酯聚合单元的树脂：其中R1表示氢或甲基，R2表示烷基，并且不溶或几乎不溶 可溶于碱，但通过由下式（V）表示的酸和酸发生剂的作用转化为可溶于碱的方法：其中Q1，Q2和Q3独立地表示氢，羟基，具有1-6个碳原子的烷基 原子或碳原子数为1〜6的烷氧基，n为4〜8的整数。 并且通过ArP准分子激光曝光得到良好的分辨率，并且基板依赖性很小。